1997 Fiscal Year Final Research Report Summary
Development of a Nano-Fabrication Center using Fast Atom Beam
| Project/Area Number |
08555064
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| Research Category |
Grant-in-Aid for Scientific Research (A)
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| Allocation Type | Single-year Grants |
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| Section | 展開研究 |
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| Research Field |
Intelligent mechanics/Mechanical systems
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| Research Institution | The University of Tokyo |
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Principal Investigator |
NAKAO Masayuki The Univ.of Tokyo, Dept.of Eng.Synthesis, Associate Prof., 大学院・工学系研究科, 助教授 (90242007)
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| Co-Investigator(Kenkyū-buntansha) |
HATAMURA Yotaro The Univ.of Tokyo, Dept.of Eng.Synthesis, Prof., 大学院・工学系研究科, 教授 (40010863)
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| Project Period (FY) |
1996 – 1997
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| Keywords | Fast Atom Beam / Etching / Thin Film Deposition / Pencil-Type Source / Concentrated Motion Manipulator |
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| Research Abstract |
This research introduces a "nano-fabrication center (NFC)"using a fast atom beam (FAB) to etch, deposit, or modify on the surface of micro workpieces. It fabricates an about 100-nm deep structure on the 10-mum wide surface. FAB is a neutralized, straight, high-energy beam.
The manipulator of NFC can move tools around a workpieces, named a "concentrated motion manipulator". It is installed in a vacuum chamber of 10^<-7> Torr.
The tools on the left and right hand have seven degree of freedom of motion each. We develop four pencil-type tools : FAB etching source, sputter source assisted by FAB,vacuum evaporation source assisted by FAB and semi-conductor laser. The three sources are made of glass tube of 10mm in diameter and 60mm in length. These have three electrodes : two of RF 30W for ionization and two of DC 3kV for acceleration. The laser of 1.6W power is used for soldering or annealing.
Using the tools, we fabricated small structure of about 100mum in diameter by etching, depositing or annealing. For example, the vacuum evaporation source can deposit a porous thin film of zinc observed like a bunch of clusters of 100nm in diameter.
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Research Products
(12 results)
