1997 Fiscal Year Final Research Report Summary
Production of Highly Overdense Uniform Plasma with a large Area by ECH.
| Project/Area Number |
08680502
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
プラズマ理工学
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| Research Institution | Shizuoka University |
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Principal Investigator |
FUKAO Masayuki Shizuoka Univ.Dept.of Electr.Eng.professor, 工学部, 教授 (40026000)
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| Co-Investigator(Kenkyū-buntansha) |
SAITOH Yoshiharu Shizuoka Univ.Dept.of Electr.Eng.Research Assistsnt, 工学部, 教務員
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| Project Period (FY) |
1996 – 1997
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| Keywords | Overdense Plasama / Wide Area Uniform Plasma / ECH plasma / Multipoie / Averaged Minimum B / Closed Magnetic Field Lines |
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| Research Abstract |
By combining an electron cyclotron resonance heating with a linear multipole magnetic field configuration, high density uniform plasmas with a large area has been asked. The plasma should be easily controllable in electron density and electron temperature and maintained easily with any kinds of gases. On the research experience to produce plasma with 2450 MHz RF source in a pulse mode operation, an equipment in steady operation necessary for applications to plasma CVD has been studied. To reduce the current to produce a magnetic field intensity necessary for ECH,an RF power of 430 MHz has been employed. As a result, stationary plasmas with electron density of as much as 2x1011 cm-3 has been realized, which density corresponds to a hundred times of the cut-off density of the used frequency. Probably, this will be the first experiment to show a clear results of ECR heating with such a low frequency. This is owing to the excellent plasma confinement characteristics of multipole configuration. Besides of this results in physics, it has been concluded by using a multipole that a truly uniform plasma can be formed in magnetic field-free zone in principle. If necessary, it is easily realized by increasing the pole number to produce a wider uniform plasma.
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