1999 Fiscal Year Final Research Report Summary
Development of Novel Materials Assembling Method Based on Nano-space Chemical Reactions
| Project/Area Number |
09305044
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| Research Category |
Grant-in-Aid for Scientific Research (A)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Inorganic materials/Physical properties
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| Research Institution | Nagoya University |
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Principal Investigator |
KOUMOTO Kunihito Nagoya University, School of Engineering, Professor, 工学研究科, 教授 (30133094)
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| Co-Investigator(Kenkyū-buntansha) |
SUZUKI Yutaka School of Engineering, Research Associate, 工学研究科, 助手 (60023214)
SEO Won Son School of Engineering, Associate Professor, 工学研究科, 助教授 (30242829)
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| Project Period (FY) |
1997 – 1999
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| Keywords | Ceramics / Thin Film / Micropatterning / Self-Assembled Monolayer / Fine Particle / Arrangement / Titanium Dioxide / Silica |
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| Research Abstract |
We have succeeded in fabricating micropatterned TiOィイD22ィエD2 films on self-assembled monolayers (SAM) of phenyltrichlorosilane (PTCS) through the precipitation from an aqueous solution containing TiFィイD26ィエD2ィイD12-ィエD1 ions. A PTCS monolayers was first formed on a silicon water and UV light was irradiated onto the masked monolayer to obtain the SAM with two-dimensionally patterned hydrophilic/hydrophobic surfaces. This patterned substrate was immersed in an aqueous solution to directly deposit TiOィイD22ィエD2 (anatase). Sonication treatment after the deposition resulted in a micropatterned TiOィイD22ィエD2 thin film.
We also succeeded in fabricating micropatterns of titanium dioxide thin films on SAMs. SAMs of OTS (octadecyltrichloro-silane) were formed on Si wafers, and were modified by UV irradiation using a photomask to generate methyl/silanol-pattern. They were used as templates to deposit titanium dioxide thin films by the use of TDD (titanium dichloride diethoxide). Amorphous films with approximate compositions Ti : O : Cl : C = 1 : 2.2 : 0.17 : 0.37 were selectively deposited on silanol regions. Line width variation of the pattern of an as-deposited film was improved to be well below the electronics design rule, 5%.
Novel processes to arrange fine silica spheres two-dimensionally on SAMs were developed. SiOィイD22ィエD2 sphere surfaces were modified to have CN groups by the use of trichlorocyanoethysilane, and CN groups were oxidized to COOH groups with t-BuOK. A SAM of PTCS with a phenyl/silanol-group pattern was used as a template to arrange fine SiOィイD22ィエD2 spheres. SiOィイD22ィエD2 spheres were selectively attached to silanol surfaces possibly forming ester bonds, which enabled the fabrication of micropatterned arrangement of SiOィイD22ィエD2 spheres.
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