MIFUNE Hirotaka Fuji Film Co.Ltd., Ashigara Res.Lab., Res.Leader, 足柄研究所, 主任研究員
KANDA Takahiro Gifu Univ., Facl.Engineering, Lecturer., 工学部, 助手 (30234157)
MURAI Toshiaki Gifu Univ., Facl.Engineering, Assoc.Prof., 工学部, 助教授 (70166239)
TAKEUCHI Hiroshi Fuji Film Co.Ltd., Ashigara Res.Lab., Res.Leader, 足柄研究所, 主任研究員
YAMADA Kohzaburo Fuji Film Co.Ltd., Ashigara Res.Lab., Res.Leader, 足柄研究所, 主任研究員
A series of alkali (RCEE'M, E, E'=O, S, Se, Te ; M=Li, Na, K, Rb, Cs] and alkali earth metal salts [(RCEE')_2M, M=Ca, Sr, Ba] of thio- (RCOSH), seleno- (RCOSeH), telluro- (RCOTeH), dithio- (RCSSH) and selenothio- (RCSSeH) were synthesized. The reactions of these alkali metal chalcogenocarboxylates (1) with a variety of Group 13, 14, 15, 16 and 17 elemet halides were inevestigated. In addition, the reaction of 1 with transition metal halides were investogated. These reactions readily proceed at 0℃ to room temperature to give the corresponding main group element derivarives in good yields. The obtained compounds all are new compounds. The X-ray structural analyses of over 170 chalcogenocarboxylic acid derivatives have beenrevealed.
Film photo-sensitivity of these chalcogenocarboxylic acid derivatives was examined. Also, these compounds, particularlly selenno- and telluro-carboxylic acid derivatives were found to be very effective as photo-sensitizer. However, the later tellurium compounds are extremely labile toward oxygen and the development of more stable tellurium comounds toward oxygen which have activity as photo-sensitizer were desired.
The development of new convenient method evaluating film-photosensitivity are in progress.