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1998 Fiscal Year Final Research Report Summary

Development of room-temperature oxidation method of Si due to pulsed hyperthermal atomic oxygen beam

Research Project

Project/Area Number 09555004
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field Applied materials science/Crystal engineering
Research InstitutionOsaka University

Principal Investigator

UMENO Masataka  Osaka Univ., Graduate School of Eng., Professor, 大学院・工学研究科, 教授 (50029071)

Co-Investigator(Kenkyū-buntansha) SHIMURA Takayoshi  Osaka Univ., Graduate School of Eng., Research Associate, 大学院・工学研究科, 助手 (90252600)
TAGAWA Masahito  Osaka Univ., Graduate School of Eng., Lecturer, 大学院・工学研究科, 講師 (10216806)
OHMAE Nobuo  Osaka Univ., Graduate School of Eng., Associate Professor, 大学院・工学研究科, 助教授 (60029345)
Project Period (FY) 1997 – 1998
Keywordsatomic oxygen / silicon / oxidation / low temperature / space environment / beam oxidation / XPS / oxygen
Research Abstract

This project dealt with the new method for room-temperature oxidation of Si wafers "using pulsed-hyperthermual atomic oxygen beam. A broad-. pulsed-, hyperthemial (5eV) atomic oxygen beam, generated by the laser-induced detonation phenomenon of oxygen gas, was applied to formation of thin oxide films on the Si (001) surface. It was clearly observed that the hypertherma.l beam can form thin oxide film (<5 nm) even at the room temperature. This is the thickness can be applied for the next generation ULSIs. The thickness of the oxide film depends on the temperatute and the atomic oxygen flux. It was also observed that the growth of oxide film obeyed the parabolic law. This was confirmed by the in-situ thickness measurement of the oxide film using X-ray photoelectron spectroscopy (XPS) which indicated the linear relationship between oxidation time versus thickness_2. This result clearly showed that the growth mechanism was rate-limited by the diffusion of atomic oxygen. It is, however, measured that the activation energy of diffusion of atomic oxygen in the SiO_2 film was as low as 0.15eV.The activation energy of diffusion of atomic oxygen in the SiO_2 film measure in the out-of-glow region of microwave- generated oxygen plasma was reported to be 0.5eV, and that of molecular oxygen in the thermal oxidation was 1.2eV.The low activation energy on diffusion of atomic oxygen in the SiO_2 film may include the inverse diffusion of interstitial Si atoms which is generated high compressive stresses applied at the Si/SiO_2 interface. In order to reduce such high interfacial stresses, it would be effective to use the premix gas of oxygen with small amount of fluorine.

  • Research Products

    (13 results)

All Other

All Publications (13 results)

  • [Publications] Kinoshita H.et al.: ""Surface characterization of the atomic oxygen exposed HOPG(0001) surfces studied by STM and AES"" Proceedings of the 21st International Symposium on Space Technology and Science. Paper No.98-b-28. (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Kinoshita H.et al.: ""A fast Atomic Oxygen Beam Facility with In-situ Testing/analysis Capabilities"" Review of Scientific Instruments. Vol.69 No.6. 2273-2277 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Kinoshita H.et al.: ""Surface reaction of a low flux atomice oxygen beam with a spin-coated polyimide film : Translational energy dependenco on the reaction efficiency"" Transactions of the Japan Society for Aeronautics and Space Sciences. Vol.41,No.132. 94-99 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Tagawa M.et al.: ""Formation of thin oxide films on room-temperature silicon (100) by exposure to a neutral beam of hyperthermal atomic and molecular oxygen"" Jpn.J.Appl.Phys.Vol.37 No.12. L1455-L1457 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Tagawa M.et al.: ""Oxidation of Room Temperature Silicon (001) Surfaces in a Hyperthermal Atomic Oxygen Beam"" Proceedings of the 7th International Symposium on Materials in a Space Environment,ESA-SP399. 225-229 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Kinoshita H.et al.: ""Hyperthermal Atomic Oxygen Interaction with Highly Oriented Pyrolytic Graphite Studied by Scanning Tunneling Microscopy"," Proceedings of the 7th International Symposium on Materials in a Space Environment,ESA-SP399. 211-216 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Shimura T., Sensui H., and Umeno M.: ""Effects of the substrate crystals upon the structure of thermal oxide layrs on Si"" Cryst.Res.Technol.33. 637-642 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Shimura T., Hosoi T., Ejiri R., and Umeno M.: ""Ordered structure in buried oxide layrs of SOI wafers"" Jpn.J.Appl.Phys. (in press.).

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Shimura T., Hosoi T., and Umeno M.: ""Analysis of ordered structure of buried oxide layrs in SIMOX wafers"" Proceedings of the 9th International Symposium on Silicon-on-Insulator Technology and Devices. (in press.).

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Tagawa M., Kinoshita H., Ninomiya Y., Kurosumi Y., Ohmae N., Umeno M.: ""Volume deffusion of atomic oxygen in a-SiO_2 protective coating at various temperatures"" Proceedings of the 44th International SAMPE Symposium and Exhibition, Long Beach, California, May 23-27. (in press.). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kinoshita H., Ikeda J., Tagawa M., Umeno M., Ohmae N.: ""A fast atomic oxygen beam facility with in-situ testing/analysis capabilities"" Review of Scientific Instruments. Vol.69 No.6. 2273-2277 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kinoshita H., Ninomiya Y., Ikeda J., Tagawa M., Umeno M., Ohmae N.: ""Surface characterization of the atomic oxygen exposed HOPG (0001) surfaces studied by STM and AES"" Proceedings of the 21st International Symposium on Space Technology and Science, May 24-31, Omiya, Japan. Paper No.98-b-28.

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Tagawa M., Ema T., Kinoshita H., Ohmae N., Umeno M., Minton T.K.: ""Formation of thin oxide films on room-temperature silicon (100) by exposure to a neutral beam of hyperthermal atomic and molecular oxygen"" Jpn.J.Appl.Phys.Vol.37 No.12. L1455-L1457 (1998)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1999-12-08  

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