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1999 Fiscal Year Final Research Report Summary

Environmentally Robust Biosensor Using Field Effect Transistors of Heteroepitaxial Diamond

Research Project

Project/Area Number 09555103
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field Electronic materials/Electric materials
Research InstitutionWaseda University

Principal Investigator

KAWARADA Hiroshi  Waseda University, School of Science and Engineering, 理工学部, 教授 (90161380)

Co-Investigator(Kenkyū-buntansha) YAMASHITA Satoshi  Tokyo Gas, Frontier Technology Lab, フロンティアテクノロジー研究所, グループリーダ
SHOJI Shouichi  Waseda University, School of Science and Engineering, 理工学部, 教授 (00171017)
Project Period (FY) 1997 – 1999
Keywordsheteroepitaxial diamond / poly crystalline diamond / FET / ISFET / ion sensor / biosensor / threshold voltage / Nemst response
Research Abstract

In this research, ion sensitive field effect transistors (ISFETs) have been fabricated on the hydrogen terminated (H-terminated) diamond surface resistant to electrochemical environment and operated as transducers of biosensors.
1. The electrolyte solution gate FETs have been formed on H-terminated surfaces. The gate structure is just thet H-terminated diamond exposed to directly. This type of FET structure where semiconductor surface is exposed to electrolyte solution is firstly developed in the world. Compared with conventional ISFET, the higher current controllability is achieved.
2. The FETs exhibit ideal current-voltage characteristics in not only homoepitaxial and heteroepitaxial diamonds, but also polycrystalline diamonds which is easier to synthesize. In the current-voltage characteristics, perfect pinch-off and the saturation of drain current have been measured. The leakage current at the off state is extremely small and the current ratio between on-off is more than 4 orders of magnitude. The FETs operate stably in the above mentioned characteristics between pH 1-14.
3. The threshold voltages of the FETs are independent from pH values. From this result, an appropriate ion sensitive base can be immobilize on the pH insensitive surface leading to high selective molecular recognition.
4. On the other hand, the threshold voltages strongly depend on the density of Cl ions in the solution and vary by 30-60 mV according to the density change by one order The Cl ion detection has been observed from 1 Mol/L to 10^<-6> Mol/L exhibiting the possibility of Cl ion sensitive FET.
The diamond solution gate FET has been developed for the first time. Their operation in hard environment has been also confirmed and the highly sensitive detection of Cl ions has been achieved.

  • Research Products

    (26 results)

All Other

All Publications (26 results)

  • [Publications] H.Kawarada et al.: "Surface morphology and surface p-channel field effect transistor on the heteroepitaxial diamond deposited on inclined.-SiC(001)surfaces"Applied Physics Letters. Vol.72. 1878-1880 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 川原田 洋: "ダイヤモンド電界効果トランジシタの現状と将来"応用物理. 67巻. 128-138 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Tsugawa and H.Kawarada: "Metal-Semiconductor Field-Effect Transistors on Hydrogen-Terminated Diamond Surfaces"Diamond Films and Technology. Vol.8. 289-297 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] A.Hokazono et al.: "Surface p-channel metal-oxide-semiconductor field effect transistors fabricated on hydrogen terminated (001)surfaces of diamond"Solid-State Electronics. Vol.43. 1465-1471 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Tsugawa et al.: "High-performance diamond surface-channel field-effect transistors and their operation mechanism"Diamond and Related Materials. Vol.8. 927-933 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Umezawa et al.: "High-Performance Diamond Metal-Semiconductor Field-Effect Transistor with 1.m Gate Length"Japan Journal of of Applied Physics. Vol.38. L1222-L1224 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Tachiki et.al.: "Control of absorbates and conduction on CVD-grown diamond surface,Using scanning probe microscope"Applied Surface Science. Vol.159-160. 578-582 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Tachiki et.al.: "Nanofabrication on Hydrogen-Terminated Diamond Surfaces By Atomic Force Microscope Probe-Induced Oxidation"Japan Journal of Applied Physics. vol.39. 4631-4632 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Kano et.al.: "Surface Order Evaluation of the Heteroepitaxial Diamond Film Grown on an inclined -SiC(001)"Japan Journal of Applied Physics. Vol.39. 4372-4373 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Umezawa et.al.: "Cu/CaF_2/Diamond Metal-Insulator-Semiconductor Field-Effect Transistor Utilizing Self-Aligned Gate Fabrication Process"Japan Journal of Applied Physics. Vol.39. L908-L910 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Kawarada et.al.: "Electrolyte-Solution-Gate FETs Using diamond Surface for Biocompatible Ion Sensors"Physica Status Solidi(a). (in press). (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 川原田 洋 他: "表面伝導層を用いたダイヤモンド電子デバイス"応用物理. (印刷中). (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Kawarada: "Chapter8"Hetero-epitaxy and highly oriented diamond deposition",in Low pressure synthetic diamond:manufacturing and applications"Springer-Verlag. 384 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Kawarada et al.: "Surface morphology and surface p-channel field effect transistor on the heteroepitaxial diamond deposited on indined. -SiC(001) surfaces"Applied physics Letters. Vol.72. 1878-1880 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kawarada: "Diamond field-effect transistor-Its present status and future"Oyobutnin. Vol.67, No.2. 128-138 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Tsugawa and H.Kawarada: "Metal-Semiconductor Field-Effect Transistors on Hydrogen-Terminated Diamond Surfaces"Dianond Films and Technology. Vol.8. 289-297 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] A.Hokazono et al.: "Surface p-channel metal-oxide-semiconduotor field effect transistors fabricated on hydrogen teminated (001) surfaces of diamond"Solid-State Electronics. Vol.43. 1465-1471 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Tsugawa et al.: "High-performance diamond surface-channel field-effect transistors and their operation mechanism"Diamond and Related makerials. Vol.8. 927-933 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Umezawa et al.: "High-Performance Diamond Metal-Semiconductor Field-Effect Transistor with 1.m Gate Length"Japan Journa of Applied Physics. Vol.38. L1222-L1224

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Tachiki et al.: "Control of adsorbents and conduction on CVD-grown diamond surface, Using scanning probe microscope"Applied Surface Science. Vol.159-160. 578-582 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Tachiki et al.: "Nanofabrication on Hydrogen-Terminated Diamond Surfaces By Atomic Force Microscope Probe-Induced Oxidation"Japan Journal of Applied Physics. Vol.39. 4631-4632 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Kano et al.: "Surface Order Evaluation of the Heteroepitaxial Diamond Film Grown on an inclined. -SiC(001)"Japan Journal of Applied Physics. Vol.39. 4372-4373 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Umezawa et al.: "Cu/CaF2/Diamond Metal-Insulator-Semiconductor Field-Effect Transistor Utilizing Self-Aligned Gate Fabrication Process"Japan Journal of Applied Physics. Vol.39. L908-L910 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kawarada et. al.: "Electrolyte-Solution-Gate FETs Using diamond Surface for Biocompatible Ion Sensors"Physica Status Solidi(a). (in Press). (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kawarada et al.: "Diamond electron devices using surface-conductive layer."Oyobutri. Vol.70(in Press). (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Kawarada: "Hetero-epitaxy and highly oriented diamond deposition"Low pressure synthetic diamond : manufacturing and applications, Springer-Verlag. 24 (1998)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2002-03-26  

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