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1999 Fiscal Year Final Research Report Summary

EVALUATION OF SCALE-UP CHARACTERISTICS AND DEVELOPMENT OF SIMULATOR FOR MANUFACTURE OF FUNCTIONAL FINE PARTICLES BY GAS - PHASE METHOD

Research Project

Project/Area Number 09555231
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field 化学工学一般
Research InstitutionHiroshima University

Principal Investigator

OKUYAMA Kikuo  HIROSHIMA UNIVERSITY, FACULTY OF ENGINEERING, PROFESSOR, 工学部, 教授 (00101197)

Co-Investigator(Kenkyū-buntansha) SHIMADA Manabu  HIROSHIMA UNIVERSITY, FACULTY OF ENGINEERING, ASSOCIATE PROFESSOR, 工学部, 助教授 (70178953)
Project Period (FY) 1997 – 1999
KeywordsFunctional Fine Particle / Chemical Vapor Deposition / Scale-up / Numerical Simulation / Titania / Distrete-Sectional Model / Gold Nanopartical / Sintering phenomenon
Research Abstract

In the experimental portion of this study,
1. A reactor equipped with wall temperature controllers for preparation of fine particles was manufactured, and the temperature distribution at the wall and inside of the reactor were measured. Analysis of the gas velocity and temperature distributions in the reactor by numerical simulation showed that these distributions governing particle formation in the reactor could be evaluated theoretically.
2. A device for generating titanium alkoxide vapor or titanium tetrachloride vapor was also manufactured, to perform experiments of manufacturing titania fine particles by feeding either of the vapors into the reactor with carrier gas using the device. The state of agglomeration, and the size distributions of agglomerates and primary particles were determined by aerosol measurement techniques and electron microscopy. The complicated changes of the characteristics of manufactured particles with reaction temperature, flow rate of the carrier gas and two … More different vapors were clarified experimentally.
In the theoretical portion, a dynamic equation to model the particle manufacturing processes was derived in which formation of supersaturated atmosphere of reaction products, coagulational particle growth from monomers via clusters to particles, morphology change of agglomerated particles by sintering and growth of primary particles and transport of particles in a nonisothermal flow field, were taken into account. Here, a new model called the 2-dimensional discrete-sectional model was constructed to predict the early stage of particle formation processes more accurately by describing the simultaneous change in size and morphology of agglomerated particles using the surface area and volume of the particles. The chemical reaction rates of the vapors used were evaluated from the experimental results to incorporate the reaction rates in the model. Numerical simulation for the particle manufacturing processes based on the model gave good prediction for size and morphology of particles manufactured under various conditions. Consequently, it was made clear that the simulation technique proposed in the present study could give useful guidelines to design and scale-up of particle manufacturing reactors. Less

  • Research Products

    (18 results)

All Other

All Publications (18 results)

  • [Publications] Okuyama,K.: "Effects of Prepration Conditions on the Characteristics of Titanium Dioxide Particlos Produced by a CVD Method"J.Aerosol Sci.. 29(S1). S907-S908 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Okuyama,K.: "Performance Evaluation of Cluster-DMA with Integrated Electrometer and Its Application to Ion Mobility Measurements"J.Aerosol Res.Jpn. 13(2). 83-93 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Fujimoto,T.: "Effect of cluster/partide deposition atomospheric presisure chemical vapor deposition of SiO_2 from four gaseous organic Si-containing precursors and ozonp"J.Appl.phys.. 85. 4196-4206 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Kuga,Y.: "Insitu Observarion of UF_5 Nanoparticle growth in a Low Pressure Mixed Flow Reactor"Appl.Phys A. 68(1). 75-80 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 浅井 琢也: "DMA内部の粒子濃度の偏りに及ぼす構造と操作条件のシミュレーションによる検討"エアロゾル研究. 14(2). 145-153 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Habuka,H.: "Chemical Process of Silicon Epitaxial Growth in a SiHCl_3-H_2 System"J.Crystal Growth. 207. 77-86 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Adachi,M.: "Film Formation by Motion Control of Ionized Precoursors in Electric Field"Appl.Phys.Lett.. 75(13). 1973-1975 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 足立 元明: "ソースガスのイオン化によるCVD成膜装置内における粒子発生の抑制"化学工学論文集. 25(6). 878-883 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 藤本 敏行: "TEOS/O_3-APCVD薄膜製造プロセスにおける蒸気とクラスター/微粒子の同時沈着の評価と制御"化学工学シンポジウムシリーズ. 67. 31-39 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Okuyama, K.: "Effects of Preparation Conditions of Titanium Dioxide Particles Produced by a CVD Method."J. Aerosol Sci.. 29(S1). S907-S908 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Okuyama, K.: "Performance Evaluation of Cluster-DMA with Integrated Electrometer and Its Application to Ion Mobility Measurements."J. Aerosol Res., Jpn.. 13(2). 83-93 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Fujimoto, T.: "Effect of Cluster/particle Deposition on Atmospheric Pressure Chemical Vapor Deposition of SiOィイD22ィエD2 from Four Gaseous Organic Si-containing Precursors and Ozone."J. Appl. Phys.. 85. 4196-4206 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kuga, Y.: "In- situ Observation of UFィイD25ィエD2 Nanoparticle Growth in a Low Pressure Mixed Flow Reactor."Appl. Phys. A. 68(1). 75-80 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Asai, T.: "Numerical Simulation on the Internal Geometry and Operation Conditions on Particle Concentration Distribution within a Differential Mobility Analyzer."J. Aerosol Res., Jpn.. 14(2). 145-153 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Habuka, H.: "Chemical Process of Silicon Epitaxial Growth in a SiHClィイD23ィエD2-HィイD22ィエD2 System."J. Crystal Growth. 207. 77-86 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Adachi, M.: "Film Formation by Mot ion Control of Ionized Precursors in Electric Field."Appl. Phys. Lett.. 75(13). 1973-1975 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Adachi, M.: "Control of Particle Generation in CVD Reactor by Ionization of Source Vapor."Kagaku Kogaku Ronbunshu. 25(6). 878-883 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Fujimoto, T.: "Evaluation and Control of Co - deposition o f Vapor and Cluster/particle in TEOS/OィイD23ィエD2-APCVD Thin Film Preparation Process."Kagaku Kogaku Symposium Series. 67. 31-39 (1999)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2001-10-23  

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