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1998 Fiscal Year Final Research Report Summary

A STUDY ON ELUCIDATION OF LUMINESCENCE EXCITATION MECHANISMS IN ERBIUM-DOPED POROUS SILICON

Research Project

Project/Area Number 09650021
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Applied materials science/Crystal engineering
Research InstitutionTOYO UNIVERSITY

Principal Investigator

MORIKAWA Takitaro  FACULTY OF ENGINEERING,PROFESSOR, 工学部, 教授 (80191013)

Co-Investigator(Kenkyū-buntansha) KOMURO Shuji  FACULTY OF ENGINEERING,ASSISTANT PROFESSOR, 工学部, 助教授 (90120336)
Project Period (FY) 1997 – 1998
Keywordsporous silicon / erbium doping / photo-luminescence
Research Abstract

The purpose of this study is to elucidate luminescence excitation mechanisms in erbiumdoped porous silicon, excitated with a high-speed light pulse, through observing the temporal relations between visible and infrared luminescence from the porous silicon and the erbium doped therein, respectively, as well as modelling the energy transfer between them.
The porous silicons formed on p-type silicon wafers with a resistivity of 1O-2OOMEGAcm by anodization were doped with the erbium using a method of immersion, and were made optically active by therml treatments. Time-resolved photo- luminescence measurements employing the pulse laser excitation was performed for the prepared samples. Differences between temporal responses of visible and infrared region suggested that it is necessary to postulate the existence of luminescence centers originating from the Coulomb interactions between optically generated electron-hole pairs and erbium ions in the host.
In relation to the elucidation of lumines … More cence mechanisms, the local structure within the samples was investigated by the X-ray absorption fine structure spectroscopy, to find the atomic coordination of the optically active center is such that an erbium atom is bonded with six oxygen atoms asymmetrically. Through experiments applying an electric-field to the sample to gain a knowledge regarding a possible quenching of luminescence, it was found that the photo- luminescence decreases rapidly for fields exceeding a critical value, probably due to the dissociation of electron-hole pairs. In addition, for erbium-doped nano-crystalline silicon samples prepared by the laser ablation, their characteristics under a high-speed pulse excitation are found to be very similar to those of erbium-doped porous silicon.
As to the observed results, the solutions of rate equations assuming the mechanism of energy transfer via luminescence centers ( vertual levels ) were in a good agreement with the experimental results. Hence, a conclusion was reached that the infrared luminescence from doped- erbium at the wavelength of 1.54 mum comes from the energy transfer to doped erbium atoms from electron-hole pairs generated within the porous silicon host. Less

  • Research Products

    (8 results)

All Other

All Publications (8 results)

  • [Publications] X.Zhao: "Photoluminescence and probe effect of Er-doped nanometer-sized Si materials" Applied Surface Science. 113/114. 121-125 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] P.O'Keeffe: "Oxygen-induced defect luminescence in porous silicon" Applied Surface Science. 113/114. 135-139 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Komuro: "Time response of 1.54μm emission from highly Er-doped nanocrystalline Si thin films prepared by laser ablation" Appl.Phys.Lett.74・3. 377-379 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Ishii: "The optically active center and its activation process in Er-doped Si thin film produced by laser ablation" J.Appl.Phys.(to be published). (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] X.Zhao et al.: "Photoluminescence and probe effect of Er-doped nanometer-sized Si materials" Applied Surface Science. 113/114. 121-125 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] P.O'Keeffe et al.: "Oxygen-induced defect luminescence in porous silicon" Applied Surface Science. 113/114. 135-139 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Komuro et al.: "Time response of 1.54mum emission from highly Er-doped nanocrystalline Si thin films prepared by laser ablation" Appl.Phys.Lett.74-3. 377-379 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Ishii et al.: "The optically active canter and its activation process in Er-doped Si thin film produced by laser ablation" J.Appl.Phys.(to be published). (1999)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1999-12-08  

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