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1998 Fiscal Year Final Research Report Summary

Low temperature growth of 3C-SiC crystal by hydrogen radical assisted plasma enhanced chemical vapor deposition

Research Project

Project/Area Number 09650028
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field 表面界面物性
Research InstitutionNagaoka Universiyt of Technology

Principal Investigator

YASUI Kanji  Nagaoka University of Technology, Faculty of Engineering, Associate Professor, 工学部, 助教授 (70126481)

Project Period (FY) 1997 – 1998
Keywordshydrogen radical / plasma CVD / cubic SiC / epitaxial growth
Research Abstract

The objective of this project is to realize the low temperature growth of 3C-SiC and epitaxial growth of it on Si substrates utilizing the hydrogen radicals generated by rf plasma.
In 1997, as a result of the experiments of crystal growth by triode plasma CVD method and by hybrid plasma CVD method allow temperature (<1000゚C) using dimethyichiorosilane and dimethylsilane as source gases, it became clear that the triode plasma CVD method using dimethylsilane was effective and the crystal growth at 600゚Cwas possible utilizing the method. The crystal growth of SiC at the low temperature was realized under the conditions of low plasma space potential and low electron temperature (<1eV) in the vicinity of the substrate surface. Reducing the hydrogen ion acceralation at sheath region by the suppression of the rf vibration of plasma space potential , the crystallinity of SiC films was further improved. Epitaxial growth on Si(100) and (111) was also successful at 1000゚C.Using the triode plasma CVD method, the surface morphplogy of SiC films was more satisfactory than that grown by thermal CVD method.
In 1998, the conditions of the dilution ratio of source gas by hydrogen and the reaction pressure were extensively controlled using the turbo molecular pump, which has high evacuation rate, for the growth of epitaxial SiC films. As a result of this experiment, highly oriented SiC epitaxial films with best crystallinity were obtained at reaction pressure of 0,3 Torr and at high dilution rate of hydrogen (>200). By changing the hydrogen dilution ratio, the residual stress of SiC on Si (111) was able to vary from coinpresive to tensile. By control the hydrogen dilution ratio, SiC epitaxial film on Si substrates with low residual stress was able to be obtained.

  • Research Products

    (12 results)

All Other

All Publications (12 results)

  • [Publications] Kanji YASUI: "Heteroepitaxy of 3C-SiC using triode plasma enhanced chemical vapor deposition on Si substrates without buffer layer." Applied Surface Science(in press). (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Abdul M.B.Hashim: "Plasma Parameter Control of the Spatially Afterglow Plasma for the Growth of 3C-SiC Epitaxial Films by Triode Plasma CVD." Extended Abstracts of 4th Int.Conf.on Reactive Plasmas. 152-153 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 安井寛治: "有機珪素化合物を用いたトライオードプラズマプラズマCVD法による結晶SiC膜の成長" 電子情報通信学会論文誌. J81-C-II. 122-128 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 安井寛治: "ジメチルシランを用いたシリコン基板上への3C-SiCエピタキシャル成長" 電子情報通信学会技術研究報告[電子部品・材料]. CPM98-124. 15-20 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Kanji YASUI: "Controls of Electron Temperature and Plasma Space Potential in the Triode Plasma CVD for the Low Temprature Growth of SiC Films." Proceedings of the 15th Symposium on Plasma Processing. 390-393 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 木村雅秀: "MCSを用いたトライオードプラズマCVD法による空間的アフターグロープラズマの最適化と結晶SiC膜の低温成長" 電子情報通信学会技術研究報告[電子部品・材料]. CPM97-355. 29-34 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Kanji YASUI: "Heteroepitaxy of 3c-SiC using triode plasma enhanced chemical vapor deposition on Si substrates without buffer layer." Appl.Surf.Sci.(in press). (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Abdul M.B.Hashim: "Plasma parameter control of the spatially afterglow plasma for the growth of 3C-SiC epitaxial films by triode plasma CVD." Ext.Abst.of 4th Int.Conf.on Reactive Plasmas. 91-92 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kanji YASUI: "Crystal growth of 3C-SiC films by triode plasma CVD using organosilicon compound." Trans.of IEICE. J81-CII. 122-128 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kanji YASUI: "Epitaxial growth of 3C-Sic on Si substrates using dimethylsilane." Technical Report of IEICE. CPM98-124. 15-20 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kanji YASUI: "Control of electron temperature and plasma space potential in triode plasma CVD for the low temperature growth of 3C-SiC films." Proc.of the 15th Symposium on Plasma Processing. 390-393 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Masahide KIMURA: "Optimization of plasma conditions in spatially afterglow plasma by triode plasma CVD and low temperature growth of SiC using DMCS" Technical Report of IEICE. CPM97-355. 29-34 (1997)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1999-12-08  

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