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1999 Fiscal Year Final Research Report Summary

Particle Changing using UV/Photoelectron Method at Low Pressures

Research Project

Project/Area Number 09650849
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field 反応・分離工学
Research InstitutionOsaka Prefecture University

Principal Investigator

ADACHI Motoaki  Osaka Prefecture University, Research Institute for Advanced Science and Technology, Assistant Professor, 先端科学研究所, 講師 (40100177)

Co-Investigator(Kenkyū-buntansha) OKUYAMA Kikuo  Hiroshima University Dept. of Chemical Engineering, Professor, 工学部, 教授 (00101197)
Project Period (FY) 1997 – 1999
KeywordsSemiconductor / Nanometer-sized particle / Vacuum process / UV excitation / Photoelectron emission / Charging / Particle collection
Research Abstract

Two devices using UV/photoelectron method were developed. In one device, photoelectrons are released from the photoelectron emitter by UV irradiation (Photoelectron emission-diffusion charging device, PE-CD) and, in other, they are done directly from particles (Direct photoelectron charging device, DPC). Two devices were estimated theoretically and experimentally. In the experiments, SiOィイD22ィエD2 particles prepared by CVD method were used. For PE-DC device, the reduce of pressure decreased strongly the particle charge, but the UV intensity and particle size gave small effects on the charge. The experimental results agreed well with numerical simulation. For DPC device, particle charge increased with the increase of UV Intensity and particle size and the decrease of the pressure. The numerical results explained the tendency of charging but did not quantitatively.

  • Research Products

    (14 results)

All Other

All Publications (14 results)

  • [Publications] 足立元明、藤本敏行、中曽浩一、金泰吾、奥山喜久夫: "ソースガスのイオンかによるCVD成膜装置内における粒子発生の抑制"化学工学論文集. 25. 878-883 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M. Adachi, T. Fujimoto, K. Nakaso, K. Okuyama, F. G. Shi, H. Sato et al.: "Film Foramton by Motion Control of lonization Precursores in Electric Field"Appl. Phys. Letters. 75. 1973-1975 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M. Adachi, T. Fujimoto, K. Okuyama: "Motion Control of lonized Intermediates in TEOS/O_3-APCVD Reactor"Proc. 1st Asia Aerosol Conf.. 219-220 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M. Shimada, K. Okuyama, Y. Inoue, M. Adachi and T. Fujii: "Removal of Airborne Particles by a Device Using U/Photoelectron Method under Reduced Presure Conditions"J. Aerosol Sci.. 30. 341-353 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 足立元明、須藤収、高橋武士: "減圧場におけるナノサイズ粒子の帯電量測定"エアロゾル研究. 13. 94-102 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M. Shimada, S. J. Cho, K. Okuyama, T. Tamura, M. Adachi and T. Fujii: "Removal of Airborn Particles by a Tublar Particle-Removal Device Using UV/Photoelectron Method"J. of Aerosol Sci.. 28. 649-661 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 足立元明、奥山喜久夫: "新版 シリコンウェーハ表面の超クリーン化技術"服部毅編 リアライズ社. 520 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Adachi, T.Fujimoto, K.Nakaso, T.Kim and K.Okuyama: "Control of Particle Generation in CVD Reactor by Ionization of Source Vapor."Kagaku Kogaku Ronbunshu. 25-6 (in Japanese). 878-883 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Adachi, T.Fujimoto, K.Nakaso, K.Okuyama, F.G.Shi, H.Sato et al.: "Film Formation by Motion Control of Ionization Precursors in Electric Field"Appl Phys. Letters. 78-13. 1973-1975 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Adachi, T.Fujimoto, K.Okuyama: "Motion Control of Ionized Intermediates in TEOS/OィイD23-ィエD2 APCVD Reactor"Proc.1st Asia Aerosol Conf.. 219-220 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Shimada, K.Okuyama, Y.Inoue, M.Adachi and T.Fujii: "Removal of Airborne Particles by a Device Using UV/Photoelectron Method under Reduced Pressure Conditions"J. Aerosol Sci.. 30-3. 341-353 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Adachi, O.Sudo, T.Takahashi: "Charge Measurement of Nanometer-Sized Particles at Low Pressure"J. of Aerosol Research, Jpn.. 13-2 (in Japanese). 94-102 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Shimada, S.J.Cho, K.Okuyama, T.Tamura, M.Adachi and T.Fujii: "Removal of Airborn Particles by a Tubular Particle-Removal Device Using UV/Photoelectron Method"J. of Aerosol Sci.. 28-4. 649-661 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Adachi and K.Okuyama: "Ultraclean Technology of Silicon Wafers"T,Hattori Ed.REALIZE Inc.. (in press). (2000)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2001-10-23  

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