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2000 Fiscal Year Final Research Report Summary

Preparation of photo catalytic sputtered films for environmental application

Research Project

Project/Area Number 11480147
Research Category

Grant-in-Aid for Scientific Research (B).

Allocation TypeSingle-year Grants
Section一般
Research Field 環境保全
Research InstitutionToyama university

Principal Investigator

MASUGATA Katsumi  Toyama university, Faculty of Engng., Associate Professor, 工学部, 助教授 (80019223)

Co-Investigator(Kenkyū-buntansha) MASUGATA Katsumi  Toyama university, Faculty of Engng., Professor, 工学部, 教授 (80157198)
Project Period (FY) 1999 – 2000
KeywordsSputtering / Photo catalysis / Thin film / Environmental material / Plasma / Titanium dioxide / Ion beam
Research Abstract

As a preparatory experiment, the microstructure and the electrical properties of TiN films deposited by facing targets sputtering (FTS) apparatus have been investigated instead of TiO_2 ones in detail. The dc discharge and the sputtering characteristics of the apparatus have also been measured in order to investigate its effectiveness. As based on above experiment, the structures and the properties of highly functional TiO_2 films for photo catalysis deposited by FTS apparatus have been investigated in detail. The sturface of the film with thickness thinner than 0.5 μm was extremely smooth.
The as-deposited films were confirmed to be anatase crystal structures from experimental results of X-ray diffraction analysis and Raman scattering spectroscopy. TiO_2 films deposited at optimum condition were nearly colorless and transparent and were composed of anatase phase crystallites with A(112), A(211) and A(220) planes normal to the film plane. When TiO_2 films were deposited at the position near the plasma, these surfaces sometimes became semitransparent and the crystallites of TiO_2 became larger. C-axis of TiO_2 crystallites was parallel to the film plane.
The optical properties of TiO_2 films have been investigated using a spectrophotometer with wavelength of 200-900 nm. When TiO_2 films were deposited at the position separated from plasma, the transmittance of them have a constant value of about 90 % at wavelength in the range from 900 nm to 349 nm. At wavelength less than 350 nm, the transmittance abruptly decreased to zero. On the other hand, as the substrate position approached plasma, the transmittance monotonically decreased with a decrease of wavelength in the range of 900 nm to 350 nm.
Accordingly, this apparatus may be useful for depositing the TiO_2. films with porous microstructure and narrower optical band gap.

  • Research Products

    (12 results)

All Other

All Publications (12 results)

  • [Publications] S.Iwatsubo,T.Takahashi,M.Naoe: "Angular Dependence of Magnetism of FeFilms Sputtered with Ion Beam Perpendicular to Target"Journal of Applied Physics. Vol.85,No.8. 5995-5997 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Iwatsubo,T.Takahashi,M.Naoe: "Effect of Surface Roughness on Magnetic Properties of Fe Films Deposited by Dual Ion Beam Sputtering"Thin Solid Films. Vol.343-344. 67-70 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Iwatsubo,T.Takahashi,M.Naoe: "An Estimation of Optimum Ar Ion Bombardment Energy for Depositing Good Fe Films Applying Thermal Spike Effect"Thin Solid Films. Vol.343-344. 71-74 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Iwatsubo,T.Takahashi,M.Naoe: "Adhesive Characteristics of Fe Films Deposited by Ion Beam Sputtering with Bombardment of Ar Ion"Thin Solid Films. Vol.343-344. 261-264 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Takahashi,K.Masugata,S.Iwatsubo,M.Asada: "Structure and Adhesive Properties of TiN Films Reactively Deposited by Plasma-Free Sputtering"Thin Solid Films. Vol.343-344. 273-276 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Takahashi,K.Masugata,H.Kawai,S.Kontani,J.Yamamoto: "Surface Morphology of TiN Films Reactively Deposited by Bias Sputtering"Vacuum. Vol.59,No.2-3. 777-784 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Iwatsubo, T.Takahashi and M.Naoe: "Angular Dependence of Magnetism of Fe Films Sputtered with Ion Beam Perpendicular to Target"Journal of Applied Physics. Vol.85, No.8. 5995-5997 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Iwatsubo, T.Takahashi and M.Naoe: "Effect of Surface Roughness on Magnetic Properties of Fe Films Deposited by Dual Ion Beam Sputtering"Thin Solid Films. Vol.343-344. 67-70 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Iwatsubo, T.Takahashi and M.Naoe: "An Estimation of Optimum Ar Ion Bombardment Energy for Depositing Good Fe Films Applying Thermal Spike Effect"Thin Solid Films. Vol.343-344. 71-74 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Iwatsubo, T.Takahashi and M.Naoe: "Adhesive Characteristics of Fe Films Deposited by Ion Beam Sputtering with Bombardment of Ar Ion"Thin Solid Films. Vol.343-344. 261-264 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Takahashi, K.Masugata, S.Iwatsubo and M.Asada: "Structure and Adhesive Properties of TiN Films Reactively Deposited by Plasma-Free Sputtering"Thin Solid Films. Vol.343-344. 273-276 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Takahashi, K.Masugata, H.Kawai, S.Kontani and J.Yamamoto: "Surface Morphology of TiN Films Reactively Deposited by Bias Sputtering"Vaccum. Vol.59, No.2-3. 777-784 (2000)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2002-03-26  

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