2001 Fiscal Year Final Research Report Summary
Control of generation, growth, and behavior of particles in ablation plasma plume by electrmagnie field
| Project/Area Number |
11558054
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 展開研究 |
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| Research Field |
プラズマ理工学
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| Research Institution | Sasebo National College of Technology |
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Principal Investigator |
KAWASAKI Hiroharu Sasebo National College of Technology; Department of Electrical Engineering, Associate Professor, 電気工学科, 助教授 (10253494)
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| Co-Investigator(Kenkyū-buntansha) |
ABE Hisao Ceramic Research Center of Nagasaki; Department of Chemical Engineering, Technical Resercher, 専門研究員
SUDA Yoshiaki Sasebo National College of Technology; Department of Electrical Engineering, Professor, 電気工学科, 教授 (20124141)
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| Project Period (FY) |
1999 – 2001
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| Keywords | Pulsed laser Deposition method / Thin Film / particle counter / Electromagnetic Field / Cluster / Droplet |
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| Research Abstract |
Pulsed Nd : YAG laser deposition (PLD) method has become a widely used technique for the deposition of thin films in the past few years due to the advantages of simple system setup, a wide range of deposition conditions, the possibility of using many kinds of materials, and a high instantaneous deposition rate.
On the other hand, several problems with the PLD method have been pointed out. Because the deposition area of this system is determined by the size of the plasma plume, large-area thin films cannot be prepared. The thickness of the film deposited by this system is not uniform because the three-dimensional profile of the plasma density in the plume is not uniform. Many micron-sized droplets are superimposed on the surface of films deposited by this method. This phenomenon is almost always observed on films grown by this method. The presence of these micron-sized droplets is the main drawback of the PLD process from the viewpoint of film quality. To solve these problems and prepare
… More
large-area uniform thin film without droplets, a new PLD method with a cross-magnetic field has been developed. In this paper, we report the effects of the cross-magnetic field on preparing large-area uniform film without droplets by the PLD method.
Two-dimensional emission profiles of the plasma plume were detected with an ICCD camera, and the shape of the plasma plume in the cross-magnetic field was changed. The density of the droplets on the substrate in the cross-magnetic field decreased in comparison with that in a non-cross-magnetic field. These experimental results suggest that high-quality and large-area uniform thin film can be prepared by using a cross-magnetic field.
In addition, because of this versatility, we have developed several kinds of functional thin films such as tungsten carbide, silicon carbide, chromium carbide, cubic boron nitride, carbon nitride, and silicon nitride by using the PLD method with cross-magnetic field. All of these films' quality increase, as compared with non-magnetic field. Less
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