2001 Fiscal Year Final Research Report Summary
Magetoresistance Effect of Nanostructure Film Produced by Pulse Electrodeposition Method
| Project/Area Number |
11650670
|
|---|
| Research Category |
Grant-in-Aid for Scientific Research (C)
|
| Allocation Type | Single-year Grants |
|---|
| Section | 一般 |
|---|
| Research Field |
Physical properties of metals
|
|---|
| Research Institution | Muroran Institute of Technogy |
|---|
Principal Investigator |
UEDA Yuji Muroran Institute of Technology, 工学部, 教授 (70001279)
|
|---|
| Project Period (FY) |
1999 – 2001
|
| Keywords | Pulse Electrodeposition / Ferromagnetic Metal / Non-ferromagnetic Metal / Multilayered Film / Alloy Film Magnetism / Eectroresistance / Computer Controlling / コンピュータ制御 |
|---|
| Research Abstract |
Research on physical properties of nanostructured materials ha attracted attention in term of fundamental physics and applications. Recent research on magneto-resistance (MR) for thin films produced in the combination of ferromagnetic and non-magnetic metals is based on films grown mainly from the vapor phase and the magnetoresistance of the films exhibits different values depending on their production method.
Electrodeposition is an advantageous method for producing alloys and metallic multilayers of generally immiscible metal combinations simply by controlling the electrodeposition condition. However, it provides the possibility of depositing film structure different from those being produced from the vapor phase.
In this study, we have investigated the relationships between the magetoresistance effect and the film structure in the nanostructured multilayered films prepared by the pulse electrodeposition method.
|
