Development for analytical methods for impurities in super-high purity base metals by combination of stripping and surface analytical methods

2000 Fiscal Year Final Research Report Summary

• Project/Area Number: 11650827
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: 工業分析化学
• Research Institution: Tohoku University
• Principal Investigator: OKU Masaoki Tohoku University, Institute for Materials Research, Associated Professor, 金属材料研究所, 助教授 (90005968)
• Co-Investigator(Kenkyū-buntansha): TUJI Koichi Tohoku university, Institute for Materials Research, Research Associate, 金属材料研究所, 助手 (30241566) ; TAKADA Kunio Tohoku University, Institute for Materials Research, Assistant Professor, 金属材料研究所, 講師 (50005930)
• Project Period (FY): 1999 – 2000
• Keywords: stripping methods / surface analysis / super high purity base metals / impurities

Research Abstract

Tellurium and selenium were deposited on silver metal of rotating electrode by non-electrolysis and electrolysis from aqueous solutions containing sodium borimide restrictively. The deposition is the pre-treatment for cathode stripping voltammetry. The chemical states and amounts of the deposited elements by XPS.The detection limits corresponding aqueous solution concentration are ng/ml order, which is comparable to the stripping method. The binding energies of the core level and kinetic energies of Auger electrons changed with the amounts of the depositions. The XPS results and surface sensitive XRD showed the existence of elemental tellurium. These results indicate that modification of the deposition conditions will decrease the detection limits of impurities in high purity base metals.