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2000 Fiscal Year Final Research Report Summary

Development of Two Beam Total-Reflection X-Ray Fluorescence and its evaluation of Analytical Performance

Research Project

Project/Area Number 11650828
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field 工業分析化学
Research InstitutionTohoku University

Principal Investigator

TSUJI Kouichi  Institute for Materials Research, Tohoku University, Research Associate, 金属材料研究所, 助手 (30241566)

Co-Investigator(Kenkyū-buntansha) WAGATSUMA Kazuaki  Institute for Materials Research, Tohoku University, Professor, 金属材料研究所, 教授 (30158597)
MATSUDA Hideyuki  Institute for Materials Research, Tohoku University, Research Associate, 金属材料研究所, 助手 (00181735)
Project Period (FY) 1999 – 2000
KeywordsX-Ray Fluorescence / Total Reflection / Surface analysis / Thin-fim Analysis / Non-destructive Analysis
Research Abstract

I developed a new equipment "2 x-ray beams excitation total reflection x-ray fluorescence (TXRF)" by modified the large goniometer that was developed by previous grant (A, 07555260). This goniometer was placed on the table of an x-ray generator of anode-rotating type (Rigaku, RU-200). The incident angle of the x-rays from this x-ray generator was changed by tilting one axis (φ) of the goniometer. A sealed-type x-ray tube was attached on another arm of the goniometer. The incident angle (χ) of the sealed-type x-ray tube was changed by moving this arm. By using this system, TXRF analysis was possible with two different x-ray beams, whose incident angle were independently controlled. Due to my long stay in Belgium and England, it took 1 year and a half to develop the above special equipment. Therefore, the term of project was not enough to finish the evaluation of the proposed method. However, it was confirmed that x-ray fluorescent intensity was enhanced by two x-ray beams irradiation. I will continuously investigate the analytical performance of this method.
During the term of this project, another method : "grazing-exit electron probe microanalysis (GE-EPMA)" was also proposed. This method enables surface-sensitive microanalysis. GE-EPMA was applied to particle analysis and thin-film analysis. The parts of the results obtained by this method were included in the report booklet of this project.

  • Research Products

    (10 results)

All Other

All Publications (10 results)

  • [Publications] K.Tsuji: "Glancing-Incidence and Glancing-Takeoff X-Ray Fluorescence Analysis of Ni-GaAs Interface-Reactions"X-Ray Spectrom.. 29. 155-160 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Hasegawa: "X-Ray Source Combined Ultrahigh-Vacuum Scanning Tunneling Microscopy for Elemental Analysis"J.Vac.Sci.Tech.B. 18. 2676-2680 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 辻幸一: "斜出射X線測定による微小領域の表面分析と微粒子分析"まてりあ(日本金属学会編). 39. 586-593 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 辻幸一: "斜出射X線測定型の電子線プローブマイクロアナリシス"X線分析の進歩(アグネ技術センター編). 32集. 25-44 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Tsuji: "Grazing-Exit X-Ray Spectrometry for Surface and Thin-Film Analysis"Anal.Sci.. 17. 145-148 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Tsuji: "Detection Limit of Grazing-Exit Electron Probe Microanalysis (GE-EPMA) for Particles Analysis"Mikrochim. Acta.. 132. 357-360 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Tsuji: "Glancing-Incidence and Glarcing-Take off X-Ray Fluorescence Analysis of Ni-GaAs Interface-Reactions"X-Ray Spectrom. 29. 155-160 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Hasegawa: "X-ray Source Combined Ultrahigh-Vacuum Scanning Tunneling Microscopy for Electron Analysis"J.Vac.Sci.Tch.B. 18. 2676-2680 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Tsuji: "Grazing-Exit X-Ray Spectrometry for Surface and Thin-Film Analysis"Anal.Sci.. 17. 145-148 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Tsuji: "Detection Limit of Grazing-Exit Electron Probe Microanalysis (GE-EPMA) for Particles Analysis"Mikrochim.Acta. 132. 357-360 (2000)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2002-03-26  

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