2002 Fiscal Year Final Research Report Summary
High performance Micro-Materials and micro-TAS by controlling high ordered Nano-Structures
| Project/Area Number |
12450102
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Intelligent mechanics/Mechanical systems
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| Research Institution | Kyoto University |
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Principal Investigator |
KOTERA Hidetoshi KYOTO UNIV., DEPT. OF MECHANICAL ENG., PROFESSOR, 工学研究科, 教授 (20252471)
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| Co-Investigator(Kenkyū-buntansha) |
WASHIZU Masao KYOTO UNIV., DEPT. OF MECHANICAL ENG., PROFESSOR, 大学院・工学系研究科, 教授 (10201162)
SHIMA Susumu KYOTO UNIV., DEPT. OF MECHANICAL ENG., PROFESSOR, 工学研究科, 教授 (70026160)
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| Project Period (FY) |
2000 – 2002
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| Keywords | MEMS / Mechanical properties / tensile test / Material distribution / Thin film material properties / Genetic algorithm / micro-TAS / Micro-pump / Micro-mixer |
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| Research Abstract |
In conventional method MEMS is produced by the photolithography process, such as PVD, CVD, dry etching and/or wet etching. Since it is hard to fabricate many parts to perform designed function in micro-meter order field, a novel method is necessary for MEMS. We focused on a photolithography process, we proposed a distribution of materials to realize a designed function for micro-pump and micro actuators.
A series of equation to simulate micro-membrane deflection is defined and a new simulation algorithm to simulate the material distribution that performs a designed function is proposed. Comparing the calculated results with experimental ones, the efficacy of the proposed method is discussed.
As example of proposed idea, bi-directional valve-less micro-pump using piezoelectric micro-array actuator and micro-mixer is fabricated.
As another method to perform a designed function, a modification of thin film after deposition is investigated. Since the electro-mechanical properties of PZT thin film is strongly depends on its internal stress, we have shown a possibility to modify PZT thin film properties by tensile stress and/or compression stress after deposition.
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