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2002 Fiscal Year Final Research Report Summary

Preparation of High Hardness Materials by Pulsed Ion-Beam Ablation

Research Project

Project/Area Number 12450280
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Structural/Functional materials
Research InstitutionNagaoka University of Technology

Principal Investigator

YATSUI Kiyoshi  Extreme Energy-Density Research Institute, Nagaoka University of Technology, Professor, 極限エネルギー密度工学研究センター, 教授 (80029454)

Co-Investigator(Kenkyū-buntansha) JIANG Weihua  Extreme Energy-Density Research Institute, Nagaoka University of Technology, Associate Professor, 極限エネルギー密度工学研究センター, 助教授 (90234682)
HARADA Nobuhiro  Engineering Department, Nagaoka University of Technology, Associate Professor, 工学部, 助教授 (80134849)
SAITOH Hidetoshi  Engineering Department, Nagaoka University of Technology, Associate Professor, 工学部, 助教授 (80250984)
IMADA Go  Engineering Department, Nagaoka University of Technology, Assistant, 工学部, 助手 (60262466)
SUEMATSU Hisayuki  Extreme Energy-Density Research Institute, Nagaoka University of Technology, Associate Professor, 極限エネルギー密度工学研究センター, 助教授 (30222045)
Project Period (FY) 2000 – 2002
KeywordsHigh Hardness Material / Thin Film / Plasma Measurement / High Pressure / Intense Pulsed Ion-Beam / Pulsed Ion-Beam Evaporation / Ablation Plasma / Surface Modification
Research Abstract

Technique to deposit thin films by pulsed ion-beam ablation plasma has been proposed and demonstrated in Extreme Energy-Density Research Institute (EDI) for the first time, which was called intense pulsed ion-beam evaporation (IBE). Until now, we revealed that a density of the ablation plasma generated by IBE method is approximately 10^<18> cm^<-3>, and a high pressure above approximately 10 GPa is applied in a target due to the reaction of the ablation plasma. In general, high hardness materials such as diamond are known to have stable phase under the conditions of high temperature and pressure. Therefore, this investigation was done to synthesize high hardness materials by using the ablation plasma, which was generated by the IBE method.
Boron carbide (B_4C) having the highest hardness next to diamond is one of difficult materials to be crystallized. Accordingly, by using the IBE method, we undertaken to prepare crystallized B_4C thin films without heat-treatment. As a result, the B_4 … More C thin films, which were crystallized without heat-treatment before and after deposition, had high hardness (Vickers hardness of 2,300). Such result is the first example in the world. Additionally, in the measurements of thermoelectric properties, the power factor of the B_4C thin films synthesized by the IBE method was observed to be approximately 3 times higher than that of B_4C samples in previous papers.
Carbon, which has many allotropes as graphite, diamond and diamond-like-carbon (DLC), is known to change structure in dependence on temperature or pressure. Accordingly, we researched on the surface modification of highly oriented pyrolytic graphite (HOPG) targets, when ion-beam was irradiated on the HOPG targets. From the results of surface observation, spherical or columnar graphite approximately 1 μm in diameter was found to exist on the irradiated HOPG targets. Since carbon is known to melt at ~5000 K and ~11 MPa, the surface of the HOPG targets can be stated to be the conditions of high temperature and pressure by irradiating ion-beam. Additionally, in the surface of the HOPG targets, disorder structure was clarified to increase with increasing in ion-beam energy density. Less

  • Research Products

    (14 results)

All Other

All Publications (14 results)

  • [Publications] K.Yatsui, H.Shinkai, K.Kashine, W.Jiang, M.Kagihiro, N.Harada: "Foil Acceleration by Intense Pulsed Ion Beam Ablation Plasma"Jpn. J. Appl. Phys.. 40(2B). 955-959 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Kitajima, T.Suzuki, W.Jiang, K.Yatsui: "Preparation of B_4C Thin Film by Intense Pulsed Ion-Beam Evaporation"Jpn. J. Appl Phys.. 40(2B). 1030-1034 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Suematsu, K.Kitajima, T.Suzuki, W.Jiang, K.Yatsui, K.Kurashima, Y.Bando: "Preparation of Polyciystalline Boron Carbide Thin Films at Room Temperature by Pulsed Ion-Beam Evaporation"Appl. Phys. Letters. 80(7). 1153-1155 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Suematsu, K.Kitajima, I.Ruiz, M.Takeda, T.Suzuki, W.Jiang, K.Yatsui: "Thermoelectric Properties of Crystalline Boron Carbide Thin Films Prepared by Ion-Beam Evaporation"Thin Solid Films. 407(1-2). 132-135 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Kashine, M.Yazawa, N.Harada, W.Jiang, K.Yatsui: "Foil Acceleration of Double-Layer Target by Intense Pulsed Ion Beam Ablation"Jpn. J. Appl Phys.. 41(6A). 4014-4018 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 樫根健史, 鈴木常生, 末松久幸, 江 偉華, 八井 浄: "高配向グラファイトへのパルスイオンビーム照射効果"電気学会パルスパワー研究会資料. PPT-03-8. 43-47 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 八井 浄, 江 偉華: "電気学会大学講座「パルス電磁エネルギー工学」"電気学会. 218 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K. Yatsui, H. Shinkai, K. Kashine, W. Jiang, M. Kagihiro, N. Harada: "Foil Acceleration by Intense Pulsed Ion Beam Ablation Plasma"Jpn. J. Appl. Phys.. 40, (2B). 955-959 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K. Kitajima, T. Suzuki, W. Jiang, K. Yatsui: "Preparation of B_4C Thin Film by Intense Pulsed Ion-Beam Evaporation"Jpn. J. Appl. Phys.. 40, (2B). 1030-1034 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H. Suematsu, K. Kitajima, T. Suzuki, W. Jiang, K. Yatsui, K. Kurashima, Y. Bando: "Preparation of Polycrystalline Boron Carbide Thin Films at Room Temperature by Pulsed Ion-Beam Evaporation"Appl. Phys. Letters. 80, (7). 1153-1155 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H. Suematsu, K. Kitajima, I. Ruiz, M. Takeda, T. Suzuki, W. Jiang, K. Yatsui: "Thermoelectric Properties of Crystalline Boron Carbide Thin Films Prepared by Ion-Beam Evaporation"Thin Solid Films. 407, (1-2). 132-135 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K. Kashine, M. Yazawa, N. Harada, W. Jiang, K. Yatsui: "Foil Acceleration of Double-Layer Target by Intense Pulsed Ion Beam Ablation"Jpn. J. Appl. Phys.. 41, (6A). 4014-4018 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K. Kashine, T. Suzuki, H. Suematsu, W. Jiang, K. Yatsui: "Ion Beam Irradiation Effect of Highly Oriented Pyrolytic Graphite [in Japanese]"Proc. IEEJ Symposium on Pulsed Power Technology. PPT-03-8. 43-47 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K. Yatsui, W. Jiang: "Engineering of Pulsed Electromagnetic Energy. In The Institute of Electrical Engineers of Japan [in Japanese]"(2002)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2004-04-14  

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