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2002 Fiscal Year Final Research Report Summary

Novel Low-Cost Technology for Fabrication of Liquid Crystal Display

Research Project

Project/Area Number 12792007
Research Category

Grant-in-Aid for University and Society Collaboration

Allocation TypeSingle-year Grants
Research Field 電子デバイス・機器工学
Research InstitutionJAIST (Japan Advanced Institute of Science and Technology)

Principal Investigator

MATSUMURA Hideki  School of Materials Science, Professor, 材料科学研究科, 教授 (90111682)

Co-Investigator(Kenkyū-buntansha) IZUMI Akira  School of Materials Science, Assistant Engineer, 材料科学研究科, 助手 (30223043)
NITTA Koh-hei  School of Materials Science, Assistant Professor, 材料科学研究科, 助教授 (70260560)
TERANO Minoru  School of Materials Science, Professor, 材料科学研究科, 教授 (90251975)
KIDA Ken-ichiro  Ishikawa Seisakusyo, LTD, システム機器開発部, 研究員
MASUDA Atsushi  School of Materials Science, Assistant Engineer, 材料科学研究科, 助手 (30283154)
Project Period (FY) 2000 – 2002
Keywordsin-print method / patterning / lithography / thin film transistor / liquid crystal display
Research Abstract

The present research is concerned with a new technology for patterning process in fabricating thin film transistors (TFTs) used in liquid crystal display. Photolithography is conventionally used for this patterning process. However, a novel method are presented in this research projects, in which patterns are formed by press of a mold having 凹凸 patterns onto organic soft films laminated on substrates. By this method, low-cost pattern printing is attempted for TFT fabrication.
Actually, by using soft organic films such as polyethylene and polysthylene, TFTs with characteristics equivalent to those fabricated by the conventional photolithography can be successfully fabricated. Additionally, during this research, a new method, in which micron-size silicon integrated circuits are attached onto substrate just like a printing ink instead of making TFT, is proposed, and its feasibility is also successfully confirmed.

  • Research Products

    (12 results)

All Other

All Publications (12 results)

  • [Publications] 木田健一郎, 新田晃平, 寺野稔, 松村英樹: "インプリント法によるTFT作製"2002-2 高分子エレクトロニクス研究会講演予稿集. 5-8 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Rui Morimoto, Akira Izumi, Atsushi Masuda, Hideki Matsumura: "Low-resistivity phosphorus-doped polycrystalline silicon thin films formed by catalytic chemical vapor deposition and successive rapid thermal annealing"Japanese Journal of Applied Physics Part 1. 41巻2A号. 501-506 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Atsushi Masuda, Akira Izumi, Hironobu Umemoto, Hideki Matsumura: "What is the difference between catalytic CVD and plasma-enhanced CVD? -Gas-phase kinetics and film properties"Vacuum. 66巻3-4号. 293-297 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Akira Izumi, Hideki Matsumura: "Photoresist removal using atomic hydrogen generated by heated catalyzer"Japanese Journal of Applied Physics Part 1. 41巻7A号. 4639-4641 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.W.Shin, H.Nakatani, T.Uozumi, B.Liu, K.Nitta, M.Terano: "Stepwise polymerization of propylene and ethylene with Cr(acethylacetonate)3/MgCl2 -ethylebenzoate/diethyle\aluminium chloride catalyst system"Polymer Int.. vol.52. 19-34 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Nitta, M.Takayanagi: "Novel Proposal of Lamellar Clustering Process for Elucidation of Tensile Yield Behavior of Linear Polyethylenes"J. Macromol. Sci. Phys.. vol.42. 109-128 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Kida, K.Nitta, M.Terano, H.Matsumura: "Fabrication of TFT for in-print method"Research Group on Electrical and Electronic Properties of Polymers. 5-8 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Rui Morimoto, Akira Izumi, Atsushi Masuda, Hideki Matsumura: "Low-resistivity phosphorus-doped polycrystalline silicon thin films formed by catalytic chemical vapor deposition and successive rapid thermal annealing"Japanese Journal of Applied Physics Part 1. Vol.41, 2A. 501-506 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Atsushi Masuda, Akira Izumi, Hironobu Umemoto, Hideki Matsumura: "What is the difference between catalytic CVD and plasma-enhanced CVD? -Gas-phase kinetics and film properties"Vacuum. Vol.66, 3-4. 293-297 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Akira Izumi, Hideki Matsumura: "Photoresist removal using atomic hydrogen generated by heated catalyzer"Japanese Journal of Applied Physics Part 1. Vol.41, 7A. 4639-4641 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.W.Shin, H.Nakatani, T.Uozumi, B.Liu, K.Nitta, M.Terano: "Stepwise polymerization of propylene and ethylene with Cr(acethylacetonate)3/MgCl2-ethylebenzoate/diethyle\aluminium chloride catalyst system"Polymer Int.. Vol.52. 19-34 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Nitta, M.Takayanagi: "Novel Proposal of Lamellar Clustering Process for Elucidation of Tensile Yield Behavior of Linear Polyethylenes"J. Macromol. Sci.-Phys.. Vol.42. 109-128 (2003)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2004-04-14  

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