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2003 Fiscal Year Final Research Report Summary

GENERATING AND ITS EVALUATION OF NANO-TEXTURE ON THE BASIS OF SELF-ORGANIZATION OF ATOMS AND PRE-PATTERNED NUCLEI

Research Project

Project/Area Number 13305013
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section一般
Research Field 機械工作・生産工学
Research InstitutionTOKYO METLOPOLITAN UNIVERSITY

Principal Investigator

KAKUTA Akira  TOKYO METLOPOLITAN UNIV., DEPT.OF MECHANICAL ENGINIERRING, RESERCH ASSOCIATE, 大学院・工学研究科, 助手 (60224359)

Co-Investigator(Kenkyū-buntansha) YANG Ming  TOKYO METLOPOLITAN UNIV., DEPT.OF MECHANICAL ENGINIERRING, ASSOCIATE PROFESSER, 大学院・工学研究科, 助教授 (90240142)
MASUDA Hideki  TOKYO METLOPOLITAN UNIV., DEPT.OF APPLIED CHEMISTRY, PROFESSER, 大学院・工学研究科, 教授 (90190363)
OKUMURA Tugunori  TOKYO METLOPOLITAN UNIV., DEPT.OF ELECTRICAL ENGINIERRING, PROFESSER, 大学院・工学研究科, 教授 (00117699)
FURUKAWA Yuji  TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY, FACULTY OF TECHNOLOGY, PROFESSER, 工学部, 教授 (10087190)
Project Period (FY) 2001 – 2003
Keywordsmono crystal silicon / molecular beam epitaxy / nano-texture
Research Abstract

We have reported that free silicon molecules grew horizontally along a silicon substrate surface under a certain condition, so-called, a step-flow type growth, and could compose both a nano-meter order flatness and a perfect crystal structure by applying molecular Beam Epitaxy (MBE).
In this study, it is clarified that the above mentioned step-flow type growth of silicon molecules can be either constrained or changed its growing direction by such geometrical patterns as regularly positioned micro-holes and grooves which are pre-shaped on the surface of silicon substrate before epitaxial deposition processes. As a result, the surface of silicon substrate can be textured at a nano-meter order.
The mechanism of texturing is discussed in view of chemophysical deposition process and constriction of molecules under the step-flow depositing conditions. Micro steps are generated toward a certain orientation which is decided by a direction of substrate inclination and this growth is hindered by the pre-shaped pattern, hence, a square-like texture with a pitch of the pattern and a nano-meter order roughness inside of the texture patch is generated.
It is revealed that various types of textured surfaces can be obtained by combining the pre-shaped geometrical patterns and depositing conditions. These silicon nano-textures are expected to be used for micro-optomechatronic contacts, replica surface of LIGA process and etc.

  • Research Products

    (11 results)

All Other

All Publications (11 results)

  • [Publications] Nobuyuki MORONUKI, Yuji FURUKAWA: "Frictional Properties of the Micro-Textured Surface of Anisotropically Etched Silicon"Annals of CIRP. 52. 471-474 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Akira KAKUTA, Nobuyuki MORONUKI, Yuji FURUKAWA: "Surface Properties of SiC Layer Grown by Molecular Beam Epitaxy with Helicon Sputtering Molecular"Proceedings of International Conference on Leading Edge Manufacturing in 21^<st> Century (LEM21). 83-88 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Akira KAKUTA, Nobuyuki MORONUKI, Yuji FURUKAWA: "Surface Properties of Sputtering SiC Layer Grown by Molecular Beam Epitaxy (MBE) with Helicon Sputtering Molecular Beam Source"JSME International Journal. 47. 123-128 (2004)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Akira KAKUTA, Nobuyuki MORONUKI, Yuji FURUKMYA: "Nano-Texturing of Surface by Constricting Epitaxial Growth of Molecules"Annals of CIRP. 51. 323-326 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 金子新, 古川勇二: "分子線エピタキシによる面創成に関する研究(第3報)-Si-Siホモエピタキシャル成長機構における結晶異方性-"精密工学会誌. 67. 1304-1309 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Akira KAKUTA, K.HASHIMOTO, N.MORONUKI, Yuji FURUKAWA: "Improvement of Properties of SiC Mirror Surface Epitaxially Grown on Silicon Substrate"Initiatives of Precision Engineering at the Beginning of a Millennium, 10th ICPE. 354-358 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Akira KAKUTA, Katsumi HASHIMOTO, Nobuyuki MORONUKI, Yuji FURUKAWA: "Improvement of Properties of SiC Mirror Surface Epitaxially Grown on Silicon Substrate"Initiatives of Precision Engineering at the Beginning of a Millennium, 10th ICPE, JSPE. 354-358 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Akira KAKUTA, Nobuyuki MORONUKI, Yuji FURUKAWA: "Nano-Texturing of Surface by Constricting Epitaxial Growth of Molecules"Annals of CIRP. Vol.51, No.1. 323-326 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Nobuyuki MORONUKI, Yuji FURUKAWA: "Frictional Properties of the Micro-Textured Surface of Anisotropically Etched Silicon"Annals of CIRP. Vol.52, No.1. 471-474 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Akira KAKUTA, Nobuyuki MORONUKI, Yuji FURUKAWA: "Surface Properties of SiC Layer Grown by Molecular Beam Epitaxy with Helicon Sputtering Molecular Beam Source"Proceedings of International Conference on Leading Edge Manufacturing in 21st Century (LEM21), JSME. 83-88 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Akira KAKUTA, Nobuyuki MORONUKI, Yuji FURUKAWA: "Surface Properties of SiC Layer Grown by Molecular Beam Epitaxy (MBE) with Helicon Sputtering Molecular Beam Source"JSME International Journal. Vol.47, No.1. 123-128 (2003)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2005-04-19  

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