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2002 Fiscal Year Final Research Report Summary

Highly Sesitive and High-resolution Amplification Solid-State Imagine System with Instant Imaging Parareli Processor

Research Project

Project/Area Number 13305024
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section一般
Research Field 電子デバイス・機器工学
Research InstitutionTOHOKU UNIVERSITY

Principal Investigator

SUGAWA Shigetoshi  Tohoku University, Graduate School of Engineering, Professor, 大学院・工学研究科, 教授 (70321974)

Co-Investigator(Kenkyū-buntansha) OHMI Tadahiro  Tohoku University, New Industry Creation Hatchery Center, Professor, 未来科学技術共同研究センター, 教授 (20016463)
KOTANI Koji  Tohoku University, Graduate School of Engineering, Associate Professor, 大学院・工学研究科, 助教授 (20250699)
Project Period (FY) 2001 – 2002
KeywordsImage Sensor / plasma CVD / Image Compression / Object Extraction
Research Abstract

This research aims at realizing of personal mobile system which can instantly import and modify information in worldwide through global network, then make a transmission or a record, and quickly find and utilize a required datum in enormous amount of information. In order to realize such system, instant transmission of the high-definition picture information, record, and search are essential technologies. Therefore, we developed the algorithm which raises the rate of picture compression after separating object completely at the time of imaging, and built the foundation of realization of the intelligent man-machine-interface system equipped with recognition and judgment processing.
First, in order to form amorphous photoelectric film used as photoelectric conversion layer without structural failure, we created the gas flow control system featuring the gas pressure control method, which can instantly control composition of gas-mixture in film formation chamber, and microwave excited high- … More density plasma equipment having dual shower-plate featuring low electron temperature, in which the novel exhaust pumps featuring non-equivalent pitch and non-equivalent angle of lead screw are implemented. By using this equipment, we established the foundation to form the highly reliable photoelectric film, which is formed by high-quality CVD, and highly selective RIE for miniaturized contact/ via-hole. Both of processes are realized by the selection of plasma-excitation gases and process-gases, respectively, which can realize suppression of both excess-decomposition of process gases and ion-bombardment-damages.
Moreover, in order to realize the highly sensitive and highly efficient image sensor which carries out noise control while imaging picture at the video rate and extracts the attributes and the amount of features which each imaged object has characteristic, such as a position of the depth direction, motion, color balance, and roughness (spatial frequency), on real time, and carries out category separation, we examined the device, circuit, and processing algorithm in detail, and completed the chip design.
Furthermore, we devised the technique of choosing the optimal image compression algorithm for every divided object category and established the foundation of the new vector quantization technique which maintains high image quality and realizes the overwhelming high compression rate. Less

  • Research Products

    (12 results)

All Other

All Publications (12 results)

  • [Publications] Shunsuke Inoue: "A3.25M-pixel APS-C size CMOS Image Sensor"2001 Workshop on Charge-Coupled Device and Advanced Image Sensors. 16-19 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 中山貴裕: "ベクトル量子化を用いた静止画像高画質高圧縮システム"電子情報通信学会技術研究報告. 47-52 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Masanori Fujibayashi: "A Still Image Encoder Based on Adaptive Resolution Vector Quantization Realizing Compressin Ratio over 1/200 Featuring Needless Calculation Elimination Architecture"2002 Symposium on VLSI Circuits Dig. Tech. Papers. 262-265 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Hiroaki Tanaka: "High Quality Silicon Oxide Film Formed by Diffusion Region PECVD arid Oxgen Radical Treatment using Microwave-Excited High-Density Plasma"Extended Abstracts of the 2002 International Conference on Solid State Devices and Materials. 424-425 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Tetsuya Goto: "A New Microwave-Excited Plasma Etching Equipment for Separated Plasma Excited Region from Etching Process Region"Extended Abstracts of the 2002 International Conference on Solid State Devices and Materials. 444-445 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Masanori Fujibayashi: "A Still Image Encoder Based on Adaptive Resolution Vecotr Quantization Employing Needless Calculation Architectures"Asisa and South Pacific Design Automation Conference 2003. 567-568 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S. Inoue, K. Sakurai, T. Koizumi, H. Hiyama, T. Asada, S. Sugawa, A. Maeda, K. Higashitani, H. Kato, K. Iizuka, M. Yamazaki: "A 3.25M-pixel APS-C size CMOS Image Sensor"2001 Workshop on Charge-Coupled Device and Advanced Image Sensors. 16-19 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T. Nakayama, N. Nozawa, M. Fujibayashi, K. Mochizuki, M. Konda, K. Kotani, S. Sugawa, T. Ohmi: "Still Image Processing Having Very High Compression Ratio and Quality Using Adaptive Resolution"Technical Report of IEICE, DSP2001-l16, ICD2001-121, IE2001-100(2001-10). 47-52 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M. Fujibayashi, T. Nozawa, T. Nakayama, K. Mochizuki, K. Konda, K. Kotani, S. Sugawa, T. Ohmi: "A Still Image Encoder Based on Adaptive Resolution Vector Quantization Realizing Compression Ratio over 1/200 Featuring Needless Calculation Elimination Architecture"2002 Symposium on VLSI Circuits Dig. Tech. Papers. 262-265 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H. TanaKa, Z. Chuanjie, M. Hirayama, A. Teramoto, S. Sugawa, T. Ohmi: "High Quality Silicon Oxide Film Formed by Diffusion Region PECVD and Oxgen Radical Treatment using Microwave-Excited High-Density"Extended Abstracts of the 2002 International Conference on Solid State Devices and Materials. 424-425 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T. Goto, H. Yamaguchi, M. Hirayama, M. Moriguchi, S. Sugawa, T. Ohmi: "A New Microwave-Excited Plasma Etching Equipment for Separated Plasma Excited Region from Etching Process Region"Extended Abstracts of the 2002 International Conferenc on Solid State Devices and Materials. 444-445 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M. Fujibayashi, T. Nozawa, T. Nakayama, K. Mochizuki, K. Kotani, S. Sugawa, T. Ohmi: "A Still Image Encoder Based on Adaptive Resolution Vector Quantizasion Enploying Needless Calculation Eliminatio"Asia and South Pacific Design Automation Conference 2003. 6D5. 567-568 (2003)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2004-04-14  

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