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2003 Fiscal Year Final Research Report Summary

The invention of interstitial-type metal nitride thin films with opto-agilent function and their device fabrication

Research Project

Project/Area Number 13305047
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section一般
Research Field Inorganic materials/Physical properties
Research InstitutionShizuoka University

Principal Investigator

TAKAHASHI Naoyuki  Shizuoka University, Faculty of Engineering, Associate Professor, 工学部, 助教授 (50242243)

Co-Investigator(Kenkyū-buntansha) KANEMITSU Yoshihiko  Nara Institute of Sci. & Tech., Graduate School of Mater. Sci., Professor, 物質創成科学研究科, 教授 (30185954)
NAKAMURA Takato  Shizuoka University, Faculty of Engineering, Professor, 工学部, 教授 (10022287)
Project Period (FY) 2001 – 2003
KeywordsInterstitial-type metal nitride / Thin film / Electron spin resonance / Opto-agilent / Device / Iron nitride / Indium nitride / Tin nitride
Research Abstract

1.The invention of interstitial-type metal nitride thin films with opto-agilent function
(1)Thin films of interstitial-type metal nitride were successfully prepared by original halide vapour phase growth under atmospheric pressure.
(2)It was clarified, for the first time, that the thin films of interstitial-type metal nitride shows opto-agilent function.
(3)By control of the nitric invasion quantity, it was found that the opto-agilent function of interstitial-type metal nitride thin films show the wavelength dependence and optical anisotropy.
2.The investigation of opto-agilent function
(1)The variation of refractivity, reflectivity and band-gap of interstitial-type metal nitride thin films originates from the change of the local structure in the film by the nitrogen invasion quantity. It was found the wavelength dependence of the function appears by these phenomena.
(2)It was clarified by ESR and SQUIED measurement that the angle dependence of opto-agilent function derived from the magnetic anisotropy of unpaired electron in a film.
3.The device fabrication of interstitial-type metal nitride thin film with opto-agilent function
(1)The device fabrication of interstitial-type metal nitride thin films were successfully, such as optical switching and modulated light.
From these results, the practical application as optics device and electron device in next generation may be possible using thin film of interstitial-type metal nitride with opto-agilent function.

  • Research Products

    (26 results)

All Other

All Publications (26 results)

  • [Publications] T.Takahashi, N.Takahashi, N.Tamura, T.Nakamura, M.Yoshioka, W.Inami, Y.Kawata.: "Growth of Fe_4N epitaxial layers displaying anomalous light reflectivity modulated by an external magnetic field"J.Mater.Chem.. 11. 3154-3158 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N.Takahashi, K.Terada, T.Nakamura: "Growth of tin nitride tin films by atmospheric pressure chemical vapor deposition using halide sources."J.Mater.Sci.. 20. 227-229 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 高橋直行, 高橋正志, 中村高遠, 金光義彦, Graham.M.Smith, Peter.C.Riedi: "オプトアジレソト機能を有する金属窒化物薄膜の作製-金属窒化物薄膜の不思議な機能"表面. 40. 141-151 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N.Takahashi, A.Niwa, T.Takahashi, T.Nakamura, M.Yoshioka, Y.Momose: "Growth of InN pillar crystal films by means of atmospheric pressure halide chemical vapor deposition."J.Mater.Chem.. 12. 1573-1576 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N.Tamura, N.Takahashi, T.Nakamura, T.Takahashi: "Growth of Fe_4N Thin Films by Atmospheric Pressure Vapor Phase Epitaxy"J.Mater.Sci.Lett.. 21. 321-323 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N.Takahashi, A.Niwa, H.Sugiura, T.Nakamura: "Indium nitride crystals with flower-like structure"Chem.Comm.. 3. 318-319 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N.Takahashi, K.Terada, T.Takahashi, T.Nakamura, W.Inami, Y.Kawata: "Optical Response of Tin Nitride Thin Films Prepared by Atmospheric Pressure Halide Chemical Vapor Deposition."J.Electron.Mater.. 32. 268-271 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N.Takahashi, M.Takekawa, T.Takahashi, T.Nakamura, M.Yoshioka, W.Inami, Y.Kawata.: "Optical recording characteristics of tin nitride thin films prepared by an atmospheric pressure halide chemical vapor deposition."Solid State Science. 5. 587-589 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Nakamura, T.Takahashi, N.Takahasi, T.Kato, K.Furukawa, G.M.Smith, C.J.Oates, PC.Riedi: "High field FMR investigation of epitaxially grown Fe_4N films on a MgO(001) substrate."Electrochem.& Solid State Letts.. 6(10). C146-C148 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N.Takahashi, A.Niwa, T.Takahashi, T.Nakamura: "Crystalline orientation of the InN films prepared by atmospheric pressurehalide chemical vapor deposition"Solid State Science. 5. 1417-1419 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 高橋 直行: "盆栽結晶-フラワー状InN結晶-"Crystal Letters. 62. 7-11 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Takahashi, N.Takahashi, T.Nakamura: "Preparation of freestanding Fe_4N crystal by vapor phase epitaxy under atmospheric pressure."Materials Chemistry & Physics. 83. 7-9 (2004)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Takahashi, N.Takahashi, T.Nakamura, T.Kato, K.Furukawa, G.M.Smith, P.C.Ried: "Magnetic characteristics of Fe_4N epitaxial films grown by halide vapor phase deposition under atmospheric pressure."Solid State Science. (In-press). (2004)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Takahashi, N.Takahashi, N.Tamura, T.Nakamura, M.Yoshioka, W.Inami, Y.Kawata: "Growth of Fe_4N epitaxial layers displaying anomalous light reflectivity modulated by an external magnetic field."J.Mater.Chem.. Vol.11. 3154-3158 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N.Takahashi, K.Terada, T.Nakamura: "Growth of tin nitride tin films by atmospheric pressure chemical vapor deposition using halide sources."J.Mater.Sci.. Vol.20. 227-229 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N.Takahashi, T.Takahashi, T.Nakamura, Y.Kanemitsu, Graham.M.Smith, Peter.C.Riedi: "Preparation of metal nitride thin films with opto-agilent function."Surface. Vol.40(in Japanese). 141-151 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N Takahashi, A.Niwa, T.Takahashi, T.Nakamura, M.Yoshioka, Y.Momose: "Growth of InN pillar crystal films by means of atmospheric pressure halide chemical vapor deposition."J.Mater.Chem.. Vol.12. 1573-1576 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N.Tamura, N.Takahashi, T.Nakamura, T.Takahashi: "Growth of Fe_4N Thin Films by Atmospheric Pressure Vapor Phase Epitaxy."J.Mater.Sci.Lett. Vol.21. 321-323 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N.Takahashi, A.Niwa, H.Sugiura, T.Nakamura, T.Nakamura: "Indium nitride crystals with flower-like structure."Chem.Comm.. Vol.3. 318-319 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N.Takahashi, K.Terada, T.Takahashi, T.Nakamura, W.Inami, Y.Kawata: "Optical Response of Tin Nitride Thin Films Prepared by Atmospheric Pressure Halide Chemical Vapor Deposition."J.Electron.Mater.. Vol.32. 268-271 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N.Takahashi, M.Takekawa, T.Takahashi, T.Nakamura, M.Yoshioka, W.Inami, Y.Kawata: "Optical recording characteristics of tin nitride thin films prepared by an atmospheric pressure halide chemical vapor deposition."Solid State Science. Vol.5. 587-589 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Nakamura, T.Takahashi, N.Takahasi, T.Kato, K.Furakawa, G.M.Smith, C.J.Oates, P C.Riedi: "High field FMR investigation of epitaxially grown Fe_4N films on a MgO(001) substrate."Electrochem. & Solid State Letts.. Vol.6. C146-C148 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N.Takahashi: "Bonsai Crystal-Flower like InN crystal."Crystal Letter. Vol.62. 7-11 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Takahashi, N.Takahashi, T.Nakamura: "Preparation of freestanding Fe_4N crystal by vapor phase epitaxy under atmospheric pressure."Materials Chemistry & Physics. Vol.83. 7-9 (2004)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Takahashi, N.Takahashi, T.Nakamura, T.Kato, K.Furukawa, G.M.Smith, P.C.Ried: "Magnetic characteristics of Fe_4N pitaxial films grown by halide vapor phase deposition under atmospheric pressure."Solid State Science. (in press). (2004)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N.Takahashi, A.Niwa, T.Takahashi, T.Nakamura: "Crystalline orientation of the InN films prepared by atmospheric pressure halide chemical vapor deposition"Solid State Science. Vol.5. 1417-1419 (2003)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2005-04-19  

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