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2003 Fiscal Year Final Research Report Summary

Low Temperature Fabrication of High-Permittivity Gate Insulating Film and Its Functional Evaluation for Next Generation LSI.

Research Project

Project/Area Number 13450130
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionKyushu University

Principal Investigator

NAKASHIMA Hiroshi  Kyushu University, Art, Science and Technology Center for Cooperative Research, Professor, 産学連携センター, 教授 (70172301)

Co-Investigator(Kenkyū-buntansha) FURUKAWA Katsuhiko  Kyushu University, Art, Science and Technology Center for Cooperative Research, Associate Professor, 産学連携センター, 助教授 (40264121)
Project Period (FY) 2001 – 2003
KeywordsSilicon / electron cyclotron resonance plasma / Sputtering / high permittivity insulating film / silicon oxide film / sislicon nitride film / stack structure
Research Abstract

This subject aims to establish the process for the stacked structure having the SiO_2 equivalent oxide thickness(BOT) of less than 2.0nm by the plasma oxidation and nitridation using electron cyclotron resonance(ECR) plasma and by the ECR-sputtering of ZrO_2. In order to do that, We investigated the effects of gas flow rate and substrate bias on the structural and electrical properties of SiO_2,SiN,and ZrO_2 thin, films, and clarified the growth mechanism. The obtained results are summarized as follows :
(1)The Kr gas is better than Ar to dilute the O_2 plasma for Si oxidation according to the current-voltage characteristics of the Si oxide film. Under the optimum condition, the as-grown Si oxide film at 130℃ shows breakdown electric field of 10-12MV/cm and interface states density of 3.2×10^<10> eV^<-1>cm^<-2>.
(2)The nitrogen partial pressure has decisive effect on the film quality. A Si nitride film having a structure nearest to stoichiometric construction is obtained by precise control of N_2 mixing ratio at 60%. Under this optimum condition, SiN film grown at 400℃, having EOT of 2.46nm, shows a leakage current more than two orders of magnitude lower than that of thermal grown SiO_2 having the same EOT.
(3)SiN film was deposited Al and then annealed at 450℃ for 30min after SiN growth by using method (2). EOT of the SiN film decreased up to 1.8nm, and the leak current and interface states density were decreased remarkably.
(4)The electrical properties of the deposited ZrO_2 films were very sensitiye to the O_2 flow rate and the dielectric breakdown field of 3-5 MV/cm was achieved under the optimum condition. The permittivity was 20.5 and an interfacial Si oxide layer was 2.3nm.
(5)The EOT having 1.8nm was achieved by using the stack structure of ZrO_2/SiN/Si, which shows a leakage current more than three orders of magnitude lower than that of thermal grown SiO_2 having the same EOT.

  • Research Products

    (16 results)

All Other

All Publications (16 results)

  • [Publications] 中島 寛: "電子サイクロトロンプラズマを活用したシリコン薄膜及び極薄シリコン酸化膜の形成とその電気的評価"真空. 45. 13-18 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 中島 寛: "ECRスパッタ法によるシリコン膜及びシリコン酸化膜の低温形成"Sputtering & Plasma Processes. 18. 35-42 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 中島 寛, 王 俊利, 趙 麗巍: "ECRプラズマを活用した高品質絶縁膜の低温形成"電子情報通信学会技術研究報告. 103. 19-23 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] J.L.Wang, T.Saitou, Y.Sugimoto, D.Wang, L.Zhao, H.Nakashima: "Effect of Ion Mass and Ion Energy on Low-Temperature Deposition of Polycrystalline-Si Thin Film on SiO_2 Layer by Using Sputtering-Type Electron Cyclotron Resonance Plasma"Japanese Journal of Applied Physics. 42. L511-L513 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] J.L.Wang, L.Zhao, N.H.Luu, K.Makiyama, D.Wang, H.Nakashima: "Growth Kinetics and Electrical Properties of Ultrathin Si Oxide Film Fabricated Using Krypton-Diluted Oxygen Plasma Excited by Electron Cyclotron Resonance"Japanese Journal of Applied Physics. 42. 6496-6501 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] L.Zhao, N.H.Luu, D.Wang, Y.Sugimoto, K.Ikeda, H.Nakashima, H.Nakashima: "Low-Temperature Growth of Thin Silicon Nitride Film by Electron Cyclotron Resonance Plasma Irradiation"Japanese Journal of Applied Physics. 43. L47-L49 (2004)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] J.L.Wang, L.Zhao, N.H.Luu, D.Wang, H.Nakashima: "Structural and electrical properties of Zr oxide film for high-k gate dielectrics by using electron cyclotron resonance plasma sputtering"Applied Physics A. (印刷中). (2004)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N.H.Luu, L.Zhao, D.Wang, Y.Sugimoto, K.Ikeda, H.Nakashima, H.Nakashima: "Optimization of Ar-diluted N_2 electron cyclotron resonance plasma for high-quality SiN film growth at low temperature"九州大学大学院総理工報告. (印刷中). (2004)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Nakashima: "fabrication of Thin Si Films and Ultra Thin Si Dioxide Films by Using Electron Cyclotron Resonance Plasmas and Electrical Evaluation of The Fabricated Thin Films"Shinkuu(in Japanese). Vol.45, No.10. 13-18 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Nakashima: Sputtering & Plasma Processes(in Japanese). Vol.18, No.1. 35-42 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Nakashima, J.L.Wang, L.Zhao: Technical Report of IEICE(in Japanese). Vol.103, No.4. 19-23 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] J.L.Wang, T.Saitou, Y.Sugimoto, D.Wang, L.Zhao, H.Nakashima: "Effect of Ion Mass and Ion Energy on Low-Temperature Deposition of Polycrystalline-Si Thin Film on SiO_2 Layer by Using Sputtering-Type Electron Cyclotron Resonance Plasma"Japanese Journal of Applied Physics. Vol.42, No.5B. L511-L513 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] J.L.Wang, L.Zhao, N.H.Luu, K.Makiyama, D.Wang, H.Nakashima: "Growth Kinetics and Electrical Properties of Ultrathin Si Oxide Film Fabricated Using Krypton-Diluted Oxygen Plasma Excited by Electron Cyclotron Resonance"Japanese Journal of Applied Physics. Vol.42, No.10. 6496-6501 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] L.Zhao, N.H.Luu, D.Wang, Y.Sugimoto, K.Ikeda, H.Nakashima: "Low-Temperature Growth of Thin Silicon Nitride Film by Electron Cyclotron Resonance Plasma Irradiation"Japanese Journal of Applied Physics. Vol.43, No.1A/B. L47-L49 (2004)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] J.L.Wang, L.Zhao, N.H.Luu, D.Wang, H.Nakashima: "Structural and electrical properties of Zr oxide film for high-k gate dielectrics by using electron cyclotron resonance plasma sputtering"Applied Physics A(Materials Science & Processing). (in press). (2004)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Luu N.H., L.Zhao, D.Wang, Y.Sugimoto, K.Ikeda, H.Nakashima: "Optimization of Ar-diluted N_2 electron cyclotron resonance plasma for high-quality SiN film growth at low temperature"Engineering Science Reports, Kyushu University(KYUSHU DAIGAKU SOGORIKOGAKU HOKOKU). (in press). (2004)

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      「研究成果報告書概要(欧文)」より

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Published: 2005-04-19  

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