2002 Fiscal Year Final Research Report Summary
Development of Direct Patterning for Ceramics Films by Soft Solution Processing
| Project/Area Number |
13450268
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Inorganic materials/Physical properties
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| Research Institution | Tokyo Institute of Technology |
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Principal Investigator |
YOSHIMURA Masahiro Tokyo Institute of Technology, Materials and Structures Laboratory, Professor, 応用セラミックス研究所, 教授 (10016826)
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| Project Period (FY) |
2001 – 2002
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| Keywords | soft solution process / solution process / pattening / ceramics / thin film / BaTiO_3 / LaCoO_2 / CdS |
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| Research Abstract |
We have developed new direct patterning methods by interface-activated reactions using an aqueous solution as follows :
(1) A laser patterning system was designed and constructed to activate quite narrow area by laser irradiation on the target substrate for on-site fabrication. The laser irradiated point on substrate is heated immediately, thus it can be activated as a micro-autoclave for hydrothermal reaction. This patterning system enabled to fabricate directly crystallized BaTiO_3, SrTiO_3 and TiO_2 thin films pattern, less than 10 micrometer in diameter, on various substrates in solutions.
(2) An ink-jet patterning system was designed and constructed to draw pattern on the substrate. Using this ink-jet patterning system, the crystallized CdS and PbS patterns has been fabricated by reaction between deferent solutions on the substrate.
(3) The direct patterning of carbon film on silicon substrate has been done by applying high voltage between silicon substrate in ethanol. The prepared carbon pattern has been investigated by Raman scattering to demonstrate that the pattern consisted of diamond like carbon.
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