2002 Fiscal Year Final Research Report Summary
Nano-mechano-electrochemistry of Passive Metal Surfaces
| Project/Area Number |
13450288
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Material processing/treatments
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| Research Institution | HOKKAIDO UNIVERSITY |
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Principal Investigator |
SEO Masahiro Hokkaido Univ., Grad. School of Eng., Prof., 大学院・工学研究科, 教授 (20002016)
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| Co-Investigator(Kenkyū-buntansha) |
FUSHIMI Koji Hokkaido Univ., Grad. School of Eng., Lect., 大学院・工学研究科, 助手 (20271645)
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| Project Period (FY) |
2001 – 2002
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| Keywords | Nano-mechano-electrochemistry / Nano-indentation / Nano-scratch / Single crystal iron / Polycrystalline titanium / Passive film / Hardness / Friction coefficient |
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| Research Abstract |
Nano-indentation and nao-scratching tests in solution were performed for in-situ evaluation of the mechano-electrochemical properties of passive single crystal iron and polycrystalline titanium surfaces electrochemically controlled in pH 8.4 borate solution. The hardness and friction coefficient of passive metal surfaces in solution could be determined from the load-depth curves measured with nano-indentation tests and from the lateral force curves measured with nano-scratching test, respectively. The hardness of the passive iron (110) surface was larger than that of the passive iron (100) surface, while the friction coefficient of the (110) surface was less than that of the (100) surface. The chromate treatment increased the hardness of both iron (110) and (100) surfaces.
The hardness and friction coefficient of the titanium surface obtained with nano-indentation and nano-scratching under the electrochemical control at 5 V were significantly larger than those of the titanium surface obtained with nano-indentation and nano-scratching in air after anodic oxidation at the same condition. The large values of hardness and friction coefficient in solution were attributed to high repassivation rate at the ruptured sites of anodic oxide film under the electrochemical control at 5 V.
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