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2003 Fiscal Year Final Research Report Summary

Methodological Development of Large Cluster Ion Generation by Swift-Heavy-Ion-Induced Electronic Sputtering

Research Project

Project/Area Number 13558061
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field Nuclear engineering
Research InstitutionKYOTO UNIVERSITY

Principal Investigator

IMANISHI Nobutsugu  KYOTO UNIVERSITY, GRADUATE SCHOOL OF ENGINEERING, PROFESSOR, 工学研究科, 教授 (10027138)

Co-Investigator(Kenkyū-buntansha) IMAI Makoto  KYOTO UNIVERSITY, GRADUATE SCHOOL OF ENGINEERING, INSTRUCT., 工学研究科, 助手 (60263117)
Project Period (FY) 2001 – 2003
Keywordssputtering / cluster ions / heavy ion irradiation / electronic sputtering / nanotechnology / nanoscale processing / emission energy distribution / laser irradiation
Research Abstract

We previously found that large cluster ions are emitted with extraordinarily high sputtering yields in an electronic-collision-dominant velocity range. Energy distribution of these cluster ions is very narrow compared to those emitted through the linear collision cascade process in a nuclear-collision-dominant velocity range. The aim of the present study is to develop energy selected pico-to nano-ampere beams of cluster ion with any size and chemical species by applying the observed phenomena.
1) The ion yield of the group Vth element emitted from III-V semiconductive chemical compounds strongly depends on the electronic stopping power because multiplicity of holes produced in the valence band plays an important role in the surface ionization process of outgoing atoms.
2) It has been found first that cluster ions are produced from the III-V semiconductive chemical compounds by swift heavy ion bombardment.
3) Emission yields of cluster ions containing the group Vth elements show an incident energy dependence different from those composed of the group IIIth elements only. This is because the group Vth atoms have high ionization potentials and the ionization efficiency depends so much on the multiplicity of holes which increases with increasing electronic stopping power, as shown in the group Vth ions.
4) Yields of cluster ions emitted from the semiconductive chemical compounds show a power law dependence on size whose exponent is independent of incident energy.
5) Beam of cluster ions can be produced by using insulating and semiconductive materials.

  • Research Products

    (13 results)

All Other

All Publications (13 results)

  • [Publications] 二宮 啓: "Material-Dependence of Electronic Sputtering Induced by MeV-Energy Heavy Ions"Vacuum. 73. 79-87 (2004)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 二宮 啓: "Cluster-Ion Emission from Semiconductive Chemical Compounds under MeV-Energy Heavy Ion Bombardment"Nuclear Instruments and Methods B. 209. 233-238 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 二宮 啓: "Material-Dependent Emission Mechanism of Secondary Atomic Ions from Solids under MeV-Energy Heavy Ion Bombardment"Nuclear Instruments and methods B. 193. 745-750 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 二宮 啓: "Secondary Ion Emission from Insulators and Semiconductors under MeV-Energy Heavy Ion Bombardment"Proc.of the 18^<th> Japan-Russia Int.Symp.on Interaction of Fast Charged Particles with Solids.Kyoto Japan, 2002. 141-145 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 二宮 啓: "Dependence of Heavy Ion Induced Secondary Ion Emission on Electric Conductivity in MeV Energy Range"Proceedings of Sixteenth International Conference on Application of Accelerators in Research and Industry. 543-547 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 〓 建明: "Mechanism of Secondary Ion Emission from an Al Sample under Mev Heavy Ion Bombardment"Proceedings of Sixteenth International Conference on Application of Accelerators in Research and Industry. 145-148 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N.Imanishi, S.Ninomiya: "Nuclear and Electronic Sputtering Induced by High Energy Heavy Ions (Review)"Journal of Nuclear and Radiochemical Sciences. (In press).

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Ninomiya, N.Imanishi: "Material-Dependence of Electronic Sputtering Induced by MeV-Energy Heavy Ions"Vacuum. 73. 79-87 (2004)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Ninomiya, N.Imanishi et al.: "Cluster-Ion Emission from Semiconductive Chemical Compounds under MeV-Energy Heavy Ion Bombardment"Nuclear Instruments and Methods B. 209. 233-238 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Ninomiya, N.Imanishi et al.: "Material-Dependent Emission Mechanism of Secondary Atomic Ions from Solids under MeV-Energy Heavy Ion Bombardment"Nuclear Instruments and Methods B. 193. 745-750 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Ninomiya, N.Imanishi et al.: "Secondary Ion Emission from Insulators and Semiconductors under MeV-Energy Heavy Ion Bombardments"Proc.of the 18^<th> Japan-Russia Int.Symp.on Interaction of Fast Charged Particles with Solids. 141-145 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Ninomiya, N.Imanishi et al.: "Dependence of Heavy Ion Induced Secondary Ion Emission on Electric Conductivity in MeV Energy Range"Proc.16^<th> Int.Conf.on Application of Accelerators in Research and Industry. 543-547 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] J.Xue, N.Imanishi et al.: "Mechanism of Secondary Ion Emission from an Al Sample under MeV Heavy Ion Bombardment"Proc.16^<th> Int.Conf.on Application of Accelerators in Research and Industry. 145-148 (2001)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2005-04-19  

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