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2002 Fiscal Year Final Research Report Summary

REVELATION OF LIGHT ACTIVE FUNCTION IN AMORPHOUS TiO3 THIN FILM

Research Project

Project/Area Number 13650010
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Applied materials science/Crystal engineering
Research InstitutionAichi University of Technology (2002)
Shizuoka University (2001)

Principal Investigator

HATANAKA Yoshinori  AICHI UNIVERSITY OF TECHNOLOGY FACULTY OF ENGINEERING PROFESSOR, 工学部, 教授 (60006278)

Co-Investigator(Kenkyū-buntansha) AOKI Toru  SHIZUOKA UNIVERSITY, RESEARCH INSTITUTE OF ELECTRONICS RESEARCH ASSOCIATE, 電子工学研究所, 助手 (10283350)
LUCEL Sirghi  SHIZUOKA UNIVERSITY, RESEARCH INSTITUTE OF ELECTRONICS ASSOCIATE PROFESSOR, 電子工学研究所, 助教授 (70324340)
KORZEC Dariusz  UNIVERSITY OF WUPPERTAL CENTER OF MICRO-STRUCTURE TECHNICAL HEAD
WROBEL Aleksander m.  POLISH ACADEMY OF SCIENCE PROFESSOR
Project Period (FY) 2001 – 2002
KeywordsEnvironmental materials / TiO2 / Plasma CVD / Hollow cathode plasma / Light catalytic function / Oxygen sensor / Hydrophilic function / Organic titanium / Coating technology
Research Abstract

A hollow-cathode jet plasma source has been developed for the generation of high density plasma radicals. By using this plasma source, amorphous TiO2 thin films are deposited from organic-titanium (titanium tetra-isopropoxide: TTIP). It has been found that the films obtained have an active function for ultra-violet light, because OH bases included in the film terminate the unpaired electron and make the defects disappeared. It has been also found that these films have high photoconductivity for ultra-violet light and sensitive in dark current for the kind of environment gas, that is, very low for oxygen and high for hydrogen. These characteristics have been investigated for the application of gas sensor.

  • Research Products

    (17 results)

All Other

All Publications (17 results)

  • [Publications] M.Nakamura, Y.Hatanaka, et al.: "Study on hydrophilic properties of hydro-oxygenated amorphous TiOx : OH thin films"Surface Science. 507/510. 778-782 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] L.Sirghi, T.Aoki, Y.Hatanaka: "Hydrophilicity of TiO2 thin films obtained by radio frequency magnetron sputtering deposition"Thin Solid Films. 422. 55-61 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] L.Sirghi, Y.Hatanaka: "Control of plasma parameters and wall sheath voltage in radio frequency magnetron discharge by grid bias"J.Appl.Phys.. 91[7]. 4026-4032 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Hatanaka et al.: "Photo-catalytic TiOx : OH film prepared by remote plasma enhanced chemical vapor deposition"Proc.of ESCAMPIG 16th. 353-354 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] P.Kazimierski, J.Tyczkowski, Y.Hatanaka, et al.: "Transition from amorphous semiconductor to amorphous insulator in hydrogenated Carbon-Germanium films investigated by Raman spectroscopy"Chemistry Materials. 14[11]. 4694-4701 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] A.M.Wrobel, Y.Hatanaka, et al.: "Remote hydrogen plasma chemical vapor deposition of silicon-carbon thin film materials from a hexamethyldisilane source"J.Appl.Polymer Sci.. 86. 1445-1458 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 畑中義式 他, 共著: "プラスチック光学部品への超精密コーティングの問題点とその対策"技術情報協会. 210 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M. Nakamura, et al: "Comparison of hydrophilic properties of amorphous TiOx films obtained by radio frequency sputtering and PE-CVD"J. Material Research. 16. 621-626 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M. Nakamura, et al: "Characterization of TiOx film prepared by PE-CVD using multi-jet-hollow cathode plasma source"Applied Surface Science. 175/176. 697-702 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M. Nakamura, et al: "Formation mechanism for TiOx thin film obtained by remote plasma enhanced chemical vapor deposition in H2-O2"Thin Solid Films. 401. 138-144 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M. Nakamura, et al: "Role of terminal OH groups on the electrical and hydrophilic properties of hydro-oxygenated amorphous TiOx:OH thin films"J. Appl. Phys.. 90. 3391-3395 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y. Hatanaka et al.: "Deposition of hard coating film on the polymer surface by plasma CVD"Extended Abst., 2001 Int. Academia. 100-104 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] L. Sirghi et al.: "Control plasma parameters and wall sheath voltage in radio frequency magnetron discharge by grid bias"J. Appl. Phys.. 91. 4026-4032 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M. Nakamura et al.: "Study on hydrophilic property of hydro-oxygenated amorphous TiOx:OH thin films"Surface Science. 507/5-8. 778-782 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y. Hatanaka et al.: "Photo-catalytic TiOx:OH film prepared by remote plasma enhanced chemical vapor deposition"Extended Abst. ESCAMPIG 16^<th>. 353-354 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] L. Sirghi et al.: "Hydrophilicity of TiO2 thin films obtained by radio frequency magnetron sputtering deposition"Thin Solid Films. 422. 55-61 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] A. M. Wrobel et al.: "Remote hydrogen chemical vapor deposition of silicon carbon thin film materials from a hexamethyldisilane source"J. Appl. Polymer Science. 86. 1445-1458 (2002)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2004-04-14  

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