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2002 Fiscal Year Final Research Report Summary

BAlGaN/AlN High Efficient UV Emitting Devices in 200nm 355nm Region

Research Project

Project/Area Number 13650383
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field 電子デバイス・機器工学
Research InstitutionKogakuin University

Principal Investigator

KAWANISHI Hideo  Kogakuin University Faculty of Engineering Professor, 工学部, 教授 (70016658)

Co-Investigator(Kenkyū-buntansha) HONDA Toru  Kogakuin University Faculty of Engineering Associate Professor, 工学部, 助教授 (20251671)
Project Period (FY) 2001 – 2002
KeywordsBAlGaN / Deep-UV / Optical Device / Residual Strain Control / Multi Buffer Layer Structure / Light Emitting Diode
Research Abstract

In 2001, room temperature PL emission was demonstrate in the first time in the world at 250 nm from high quality (BAlGaN/AlN) Multiple-Quantum Well Structure which was grown on the (GaN/AlN) Multi-Buffer Layer Structure and controlled the residual strain bun the buffer layer structure. And Second important research result was obtaining of the lattice matching-system to the SiC substrate both for BGaN and BAIlN
In 2002, High efficient UV emitting device research was started. (GaN/AlGaN) double-hetero-structure tight emitting diodes were demonstrated on the SiC substrate by controlling residual-strain with the (GaN/AlN) Multi-Buffer-Layer-Structure. Emitting wavelength was 330nm at room temperature and maximum light output power was 0.2 mW at driven current of 200mA for Edge Emission. This results mean that the efficient light emitting diodes were obtained and corresponding light output power form the surface emitting diode was as high as 2-2.4mW. Another important result was the first demonstration of n-type conductance of the BGaN epitaxial layer with 2% of Boron, However p-type conductance was not demonstrated up to this time. Most recent important result was lasing oscillation at 350nm of the (AlGaN/AlGaN)-MQW laser diode under Optical pumping.

  • Research Products

    (14 results)

All Other

All Publications (14 results)

  • [Publications] T.Takano, M.Kurimoto, J.Yamamoto, H.Kawanishi: ""Epitaxial growth of high quality BAlGaN quaternary lattice matched to AlN on 6H--SiC substrate by LP-MOVPE for deep-UV"J. Crystal Growth. Vol.237239. 972-977 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Honda, K.Sato, T.Hashimoto, M.Shinohara, H.Kawanishi: "GaN growth by compound source molecular beam epitaxy"J. Crystal Growth. Vol.237239. 237-239 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Horie, Y.Ishihara, J.Yamamoto, M Kurimoto, H.Kawanishi: ""Optical Characteristic of the Strain-Controlled GaN Epitaxial Layer Grown on 6H-SiC Substrate by an Adapting (GaN/AlN) Multibuffer Layer ","phys. Stat. sol..(a). Vol.192 No.1. 151-156 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Honda, Y.Inao, K.Konno, K, Mineo, S.Kumabe, H.Kawanishi: "Deposition of Amorphous GaN by Compound Source Molecular Beam Epitaxy for Electroluminescent Devices"Phys. Stat. sol..(a). Vol.192 No.1. 461-465 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Kawanishi, T.Takano, M.Kurimoto, Y.Ishihara, M.Horie, J.Yamamoro: "Improved optical quality of BAlGaN/AlN MQW structure grown on 6H-SiC substrate by controlling residual strain using multi-buffer laver"2000 Mat. Res. Soc. Symp. Proc.. Proc.Vol.639. G11.9.1-G11.9.6. (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Honda, H.Kawanishi: "Emission Characteristics of GaN-Based EL Device with AC Operation"2000 Mat. Res. Soc. Symp. Proc.. Proc.Vol.639. G11.13.1-G11.13.6. (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S,Watanabe: "Refractive indices of BxAl_<1-x>N(x=0-0.012) and ByGa_<1-y>N(y=0-0.023) epitaxial layers in ultra-vioret region"to be appeared from Physica Status Solidi.

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T,Takano: "Epitaxial growth of high quality BAlGaN quaternary lattice matched to AlN on 6H-SiC substrate by LP-MOVPE for deep-UV emission"J. Crystal Growth. Vol. 237-239. 972-977 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T,Honda: "GaN growth by compound source molecular beam epitaxy"J. Crystal Growth. Vol. 237-239. 237-239 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M,Horie: "Optical Characteristic of the Straine-Controlled GaN Epitaxial Layer Grown on 6H-SiC Substrate by an Adapting (GaN/AlN) Multibuffer Layer"phys. Stat.sol. (a). No. 1. 151-156 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T,Honda: "Deposition of Amorphous GaN by Compound Source Molecular Beam Epitaxy for Eelectroluminescent Devices"phys. Stat.sol. (a). No. 2. 461-465 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H,Kawanishi: "Improved optical quality of BAlGaN/AlN MQW structure grown on 6H-SiC substrate by controlling residual train using multi-buffer layer"2000 Mat Res. Soc. Symp. Proc. Vol.639. G12.9.1-G12.9.6 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T,Honda: "Emission Characteristics of GaN-Based EL Device with AC Operation"Mat. Res. Symp. Proc. vol 639. G11.13.1-G11.13.6 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T,Honda: "GaN Growth by Compound Source MBE Using GaN Powder"Phys. Stat Sol.(a). vol. 188,no.2,(12). 587-590 (2001)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2004-04-14  

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