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2003 Fiscal Year Final Research Report Summary

Plasma Anisotropic CVD for Cu Interconnects in LSI

Research Project

Project/Area Number 14350021
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field 表面界面物性
Research InstitutionKyushu University

Principal Investigator

SHIRATANI Masaharu  Kyushu University, Grad.School of Info.Sci.and Electrical Eng., Associate Prof., 大学院・システム情報科学研究院・電子デバイス工学部門, 助教授 (90206293)

Co-Investigator(Kenkyū-buntansha) KOGA Kazunori  Kyushu University, Grad.School of Info.Sci.and Electrical Eng., Reasearch Associate, 大学院・システム情報科学研究院・電子デバイス工学部門, 助手 (90315127)
WATANABE Yukio  Kyushu University, Grad.School of Info.Sci.and Electrical Eng., Prof., 大学院・システム情報科学研究院・電子デバイス工学部門, 教授 (80037902)
Project Period (FY) 2002 – 2003
KeywordsCu Interconnects / Plasma CVD / Anisotropic Deposition / Ion-Assisted Deposition / Sputtering / Monte-Carlo Simulation / LSI / Deposition Profile in Trench
Research Abstract

We have realized anisotropic deposition of Cu, for which Cu is filled preferentially from the bottom of trenches without being deposited on their sidewall, using H-assisted plasma chemical vapor deposition. The anisotropic deposition has two interesting features. One is the fact that the narrower the width of trench is, the faster the deposition rate on its bottom becomes. The other is the self-limiting characteristic that the deposition in the trench stops automatically just after filling completely it. Such type of deposition has a potential to overcome common problems associated with conformal filling : a small crystal grain size below a half of the trench width, and formation of a seam with residual impurities of relatively high concentration.

  • Research Products

    (26 results)

All Other

All Publications (26 results)

  • [Publications] K.Takenaka, M.Onishi, M.Takenaka, T.Kinoshita, K.Koga, M.Shiratani, Y.Watanabe: "Anisotropic Deposition of Copper by Plasma CVD Method"Proc.Int.Symp.Dry Process. 221-226 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Takenaka, H.J.Jin, M.Onishi, K.Koga, M.Shiratani, Y.Watanabe, T.Shingen: "Conformal deposition of pure Cu films in trenches by H-assisted plasma CVD using Cu(EDMDD)_2"Proc.ESCANPIG16/ICRP5. II-173-II-174 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Takenaka, H.J.Jin, M.Onishi, K.Koga, M.Shiratani, Y.Watanabe: "Anisotropic deposition of Cu with H-assisted plasma CVD"Proc.ESCANPIG16/ICRP5. II-199-II-200 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Takenaka, M.Onishi, T.Kinoshita, K.Koga, M.Shiratani, Y.Watanabe, T.Shingen: "Deposition of Cu films in trenches for LIS interconnects by H-assisted plasma CVD method"Proc.International Workshop on Information Sicnec and Electrical Engineering 2002. 227-232 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Takenaka, M.Shiratani, M.Onishi, M.Takeshita, T.Kinoshita, K.Koga, Y.Watanabe: "Anisotropic Deposition of Copper by H-Assisted Plasma Chemical Vapor Deposition"Matr.Sci.Semiconductor Processing. 5. 301-304 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Takenaka, M.Onishi, M.Takeshita, T.Kinoshita, K.Koga, M.Shiratani, Y.Watanabe: "Anisotropic Plasma Chemical Vapor Deposition of Copper Films in Trenches"MRS Symp.Proc.. 766. E3.8.1-E3.8.6 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Takenaka, M.Takeshita, K.Koga, M.Shiratani, Y.Watanabe: "Conformal and Anisotropic Deposition of Cu in Trenches by using H-Assisted Plasma CVD Method"Proc.International Symposium on Information Science and Electrical Engineering 2003. 514-517 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Takenaka, M.Takeshita, K.Koga, M.Shiratani, Y.Watanabe: "Residual Stress in Cu Films Deposited by H-Assisted Plasma CVD Using Cu(EDMDD)_2"Proc.2003 International Symposium on Dry Process. 231-236 (2003)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Shiratani, K.Takenaka, K.Koga, Y.Watanabe: "Anisotropic deposition of Cu using plasma CVD(Invited Lecture)"Proceedings of International COE Forum on Plasma Science and Technology. 33-34 (2004)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Takenaka, M.Takeshita, K.Koga, M.Shiratani, Y.Watanabe: "Dissociative ionization of Cu(EDMDD)_2 by electron impact"Proceedings of International COE Forum on Plasma Science and Technology. 171-172 (2004)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Takenaka, M.Kita, T.Kinoshita, K.Koga, M.Shiratani, Y.Watanabe: "Anisotropic Deposition of Cu in trenches by H-assisted plasma Chemical Vapor Deposition (Invited Lecture Paper)"Journal of Vacuum Science and Technology A. 22(in press). (2004)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Takenaka, M.Shiratani, M.Takeshita, M.Kita, K.Koga, Y.Watanabe: "Control of deposition profile of Cu for LSI interconnescts by plasma chemical vapor deposition (Invited Lecture Paper)"Pure & Applied Chemistry. (in press). (2004)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Takenaka, M.Takeshita, K.Koga, M.Shiratani, Y.Watanabe: "Effects of ion irradiation on plasma anisotropic CVD"Proceedings of International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources. (in press). (2004)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Takenaka, M.Onishi, M.Takenaka, T.Kinoshita, K.Koga, M.Shiratani, Y.Watanabe: "Anisotropic Deposition of Copper by Plasma, CVD Method"Proc.Int.Symp.Dry Process. 221-226 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Takenaka, H.J.Jin, M.Onishi, K.Koga, M.Shiratani, Y.Watanabe, T.Shingen: "Conformal deposition of pure Cu films in trenches by H-assisted plasma CYD using Cu(EDMDD)_2"Proc.ESCANPIG16/ICRP5. II-173-Ii-174 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Takenaka, H.J.Jin, M.Onishi, K.Koga, M.Shiratani, Y.Watanabe: "Anisotropic deposition of Cu with H-assisted plasma CVD"Proc.ESCANPIG16/ICRP5. II-199-II200 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Takenaka, M.Onishi, T.Kinoshita, K.Koga, M.Shiratani, Y.Watanabe, T.Shingen: "Deposition of Cu films in trenches for LIS interconnects by H-assisted plasma CVD method"Proc.International Workshop on Information Sicnec and Electrical Engineering 2002. 2002. 227-232 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Takenaka, M.Shiratani, M.Onishi, M.Takeshita, T.Kinoshita, K.Koga, Y.Watahabe: "Deposition of Copper by H-Assisted Plasma Chemical Vapor Deposition"Matr.Sci.Semiconductor Processing. 5. 301-304 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kosuke Takenaka, Masao Onishi, Manabu Takeshita, Toshio Kinoshita, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe: "Anisotropic Plasma Chemical Vapor Deposition of Copper Films in Trenches"MRS Symp.Proc.. 766. E3.8.1-E3.8.6 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kosuke Takenaka, Manabu Takeshita, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe: "Conformal and Anisotropic Deposition of Cu in Trenches by using H-Assisted Plasma CVD Method"Proc.International Symposium on Information Science and Electrical Engineering 2003. 2003. 514-517 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kosuke Takenaka, Manabu Takeshita, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe: "Residual Stress in Cu Films Deposited by H-Assisted Plasma CVD Using Cu(EDMDD)_2"Proc.2003 International Symposium on Dry Process. 231-236 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Masaharu Shiratani, Kosuke Takenaka, Kazunori Koga, Yukio Watanabe: "Anisotropic deposition of Cu using plasma CVD(Invited Lecture)"Proceedings of International COE Forum on Plasma Science and Technology. 33-34 (2004)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kosuke Takenaka, Manabu Takeshita, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe: "Dissociative ionization of Cu(EDMDD)_2 ]by electron impact"Proceedings of International COE Forum on Plasma Science and Technology. 171-172 (2004)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kosuke Takenaka, Makoto Kita, Toshio Kinoshita, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe: "Anisotropic Deposition of Cu in trenches by H-assisted Plasma Chemical Vapor Deposition(Invited Lecture Paper)"Journal of Vacuum Science and Technology A. 22(in press). (2004)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kosuke Takenaka, Masaharu Shiratani, Manabu Takeshita, Makoto Kita, Kazunori Koga, Yukio Watanabe: "Control of deposition profile of Cu for LSI interconnects by plasma chemical vapor deposition(Invited Lecture Paper)"Pure & Applied Chemistry. (in press). (2004)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Kosuke Takenaka, Manabu Takeshita, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe: "Effects of ion irradiation on plasma anisotropic CVD"Proceedings of International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources. (in press). (2004)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2005-04-19  

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