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2004 Fiscal Year Final Research Report Summary

J-aggregation formation of dye ultra thin films and sophisticated nano febrication using applied voltage Langmuir-Blodgett method

Research Project

Project/Area Number 14550291
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionChiba University

Principal Investigator

KUSHIDA Masahito  Chiba University, Faculty of engineering, Research associate, 工学部, 助手 (70177989)

Co-Investigator(Kenkyū-buntansha) SUGITA Kazuyuki  Chiba University, Faculty of engineering, Professor, 工学部, 教授 (70009273)
SAITO Kyoichi  Chiba University, Faculty of engineering, Professor, 工学部, 教授 (90158915)
Project Period (FY) 2002 – 2004
KeywordsLangmuir-Blodgett films / Applied voltage LB method / Dye LB films / Nano technology / Nano fabrication / Molecular electronics / J-aggregation / Patterning
Research Abstract

1.2002,Fabrication of applied voltage LB trough
Applied voltage LB trough was fabricated. The distance between water surface and counter electrode was one to five mm, applied voltage was -2500 to +2500 V, the maximum electric field was 25 kV/cm. The action force to molecule in L film by the electric field was larger than that by surface tension, so the orientation of molecule in L film and LB films was able to be controlled.
2.2003,Applied voltage polarity and subphase condition
Optimization of the applied voltage polarity, L film leaving time after applied voltage and pH of subphase, the orientation of LB films and the ratio of transferred L film to LB films.
3.2004,Molecular orientation of L film and LB films
We clarified that the limiting molecular area in L film was controlled, when applied voltage between the water surface and the counter electrode after spread molecular on the water surface. We clarified that the layer-to-layer spacing in applied voltage LB films was shorter than that in non applied voltage LB films using X-ray diffraction. We clarified that the molecular density in applied voltage LB films decreased using ultraviolet visible absorption spectrum. We clarified that the selective molecules in the parallel of LB films were deposited, and the orientation of molecule was controlled.

  • Research Products

    (18 results)

All 2005 2004 2003 2002

All Journal Article (18 results)

  • [Journal Article] Energy Release and It's Mechanism in Metal/Insulator/Metal Structures with Langmuir-Blodgett films2005

    • Author(s)
      Koji Hino
    • Journal Title

      Jpn.J.Appl.Phys. 44

      Pages: 551-555

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Energy Quenching Effects on Dry-Etching Durability of Alicyclic-Aliphatic Copolymers and Polymer Blends Enhanced by Polymer-Chain Entanglement2005

    • Author(s)
      Masahito Kushida
    • Journal Title

      Jpn.J.Appl.Phys. 44

      Pages: 1498-1501

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep UV Lithography : IIIa. Preliminary Results of Optimization of PAG and Content2004

    • Author(s)
      Kazuyuki Sugita
    • Journal Title

      Advances in Imaging Materials and Processes

      Pages: 293-299

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep UV Lithography : IIIb. Optimization of PAG and Its Content2004

    • Author(s)
      Kazuyuki Sugita
    • Journal Title

      J.Photopolym.Sci.Technol. 17

      Pages: 373-378

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Control of Photo and Thermal Decomposition of Diazo/PVA Resist with inclusion Compounds2004

    • Author(s)
      Keiko Harada
    • Journal Title

      Advances in Imaging Materials and Processes

      Pages: 369-373

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep UV Lithography : IIIa. Preliminary Results of Optimization of PAG and Its Content2004

    • Author(s)
      Kazuyuki Sugita
    • Journal Title

      Advances in Imaging Materials and Processes

      Pages: 293-299

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] A Surface-Silylated Single-Layer Resist UsingO Chemical Amplification for Deep UV Lithography : IIIb. Optimization of PAG and Its Content2004

    • Author(s)
      Kazuyuki Sugita
    • Journal Title

      J.Photopolym.Sci.Technol. 17

      Pages: 373-378

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] Control of Photo and Thermal Decomposition of Diazo/PVA Resist with inclusion Compounds2004

    • Author(s)
      Kieko Harada
    • Journal Title

      Advances in Imaging Materials and Processes

      Pages: 369-373

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] Study of Electric Dipole and Space Charge Characteristics of Al/C(12)TCNQ/Al by Means of Thermally Stimulated Current Measurements2003

    • Author(s)
      Masahito Kushida
    • Journal Title

      Thin Solid Films 423

      Pages: 224-227

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Organic bistable memory switching phenomena in squarylium-dye Langmuir-Blodgett films2003

    • Author(s)
      Masahito Kushida
    • Journal Title

      Jpn.J.Appl.Phys. 42

      Pages: L622-L624

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Photodegradable Toners for Electrophotography III. Accelerated Photodegradation and Suppressed Photocrosslinking of Matrix Resin-Their Dependence on Polymer Composition, UV-light Source, and Irradiation Conditions2003

    • Author(s)
      Kazuyuki Sugita
    • Journal Title

      Polymer J. 35

      Pages: 985-992

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Photodegradable Toners for Electrophotography IIIb. Photodegradation and Photocrosslinking of Matrix Resin - Its Dependence on the UV-light Source and Irradiation Conditions and Reaction Mechanism2003

    • Author(s)
      Kazuyuki Sugita
    • Journal Title

      Polymeric Mat.Sci.Eng. 88

      Pages: 341

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Photodegradable Toners for Electrophotography IIIb. Photodegradation and Photocrosslinking of Matrix Resin-Its Dependence on the UV-light Source and Irradiation Conditions and Reaction Mechanism2003

    • Author(s)
      Kazuyuki Sugita
    • Journal Title

      Polymeric Mat.Sci.Eng. 88

      Pages: 341

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] Imaging Characteristics of Diazo Resin with a Dialkylamino Group for Screeen Printing2002

    • Author(s)
      Kieko Harada
    • Journal Title

      J.Imaging Sci.Technol. 46

      Pages: 159-164

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Conductance Switching Phenomena and H-Like Aggregates in Squarylium-Dye Langmuir Blodgett Films2002

    • Author(s)
      Masahito Kushida
    • Journal Title

      Jpn.J.Appl.Phys. 41

      Pages: L281-L283

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep-UV and Vacuum-UV Lithography2002

    • Author(s)
      K.Sugita
    • Journal Title

      J.Photopolym.Sci.Technol. 15

      Pages: 367-370

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Imaging Characteristics of Diazo Resin with a Dialkylamino Group for Screen Printing2002

    • Author(s)
      Kieko Harada
    • Journal Title

      J.Imaging Sci.Technol. 46

      Pages: 159-164

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep-UV and Vacuum-UV Lithography2002

    • Author(s)
      K.Sugita A
    • Journal Title

      J.Photopolym.Sci.Technol. 15

      Pages: 367-370

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2006-07-11  

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