2007 Fiscal Year Final Research Report Summary
Application of microplasma to materials device process
| Project/Area Number |
15075202
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| Research Category |
Grant-in-Aid for Scientific Research on Priority Areas
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| Allocation Type | Single-year Grants |
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| Review Section |
Science and Engineering
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| Research Institution | The University of Tokyo |
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Principal Investigator |
TERASHIMA Kazuo The University of Tokyo, Department of Advanced Materials Science, Associate Professor (30176911)
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| Co-Investigator(Kenkyū-buntansha) |
KOSHIZAKI Naoto Agency of Industry Science and Technology, Nano Architectoronics Center, Group Leader (Research) (40344197)
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| Project Period (FY) |
2003 – 2007
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| Keywords | Microplasma / Materials processing / Supercritical fluid / Supercritical fluid plasma / Atmospheric plasma jet / Carbon nano-materials / Plasma fiber / Plasma chip |
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| Research Abstract |
Based on the unique characteristics of microplasmas, such as an extraordinary locality and high density, development of various new application technologies are in progress. These include, e.g., novel materials processing, biomaterials treatment, chemical analysis, light sources of ultra-short wavelengths.
In our group, in order to establish microplasma materials device processing, these studies have been performed as follows:
(A) Development of high-rate materials device processing with using supercritical fluid (SCF) plasma: We developed supercritical fluid plasma devices and diagnosed the plasma properties. Applications of it to deposition of carbon and copper thin films were performed. These achievements make the non-equilibrium with high density and high-synthesis preparation of carbon nano-materials near the critical point.
(B) Synthesis of novel materials by various microplasmas: We developed various types of microplasmas, such as atmospheric and in liquid plasma devices. Plasma diagnoses were performed to observe the super-non-equilibrium. Novel carbon-nano-materials were also found.
(C) Fabrication of integrated plasma materials processing devices (plasma chip and plasma panel): We developed integrated plasma materials processing devices such as plasma chip and plasma panel, and diagnosed their plasma properties.
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