2004 Fiscal Year Final Research Report Summary
Fabrication and analysis of 3-dimensional structure with nano-particles by nano-explosion of metal oxide thin film
| Project/Area Number |
15310108
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Microdevices/Nanodevices
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| Research Institution | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY |
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Principal Investigator |
NAKANO Takashi National Institute of Advanced Industrial Science and Technology, Center for Applied Near-field Optics Research, Team Leader, 近接場光応用工学研究センター, 研究チーム長 (90254432)
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| Project Period (FY) |
2003 – 2004
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| Keywords | Photonic crystal / Optical disc / Super-RENS / Metal oxide / Phase change material / Near-field optics / Local plasmon / Birefringence |
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| Research Abstract |
The relation between the focus position of laser beam and the pit formation by nano-explosion of metal-oxide thin film was analyzed. From this experiment, it is clear that the focus position control is very important to fabricate the nano-pits by nano-explosion, because the thermal property of platinum oxide film is very sensitive as compared with the intensity distribution in the focus spot. This sensitivity is very important to fabricate the 3-dimentional structure by focus position shift in the multi stacked platinum oxide thin film sandwiched by dielectric thin layers. The 150 nm size pits with platinum nano-particles were fabricated using a conventional disk drive tester.
I designed the wave guide using the photonic crystal which was possible to fabricate by nano-explosion of platinum oxide layer sandwiched by dielectric layers and calculated its effect. I also designed the polarizer using nano-dots including nano metal-particles and estimated its effect. It became clear there was a possibility that the optical component was able to be made from this technique by these calculations.
To make a nano-structure with high-aspect ratio, the property of nano-dots by nano-explosion as mask of a dry etching was estimated. To select the material, it was possible to give a large different etching rate between nano-hole and space. Therefore, it succeeded in making the nano-structure of a high aspect ratio (100 nm width, 500 nm depth).
It is thought that the processing technology of the minute pit structure to use the nano-explosion of the proposed metallic oxide thin film was able to be established enough from these results. It wants to advance the improvement of the device, and to advance the optical device development by this technique in the future.
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