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2004 Fiscal Year Final Research Report Summary

Two dimensional crystallization of ferritin protein for nano-scale process in semiconductor fabrication

Research Project

Project/Area Number 15360013
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Applied materials science/Crystal engineering
Research InstitutionNara Institute of Science and Technology

Principal Investigator

URAOKA Yukiharu  Nara Institute of Science and Technology, Graduate School of Materials Science, Associate Professor, 物質創成科学研究科, 助教授 (20314536)

Co-Investigator(Kenkyū-buntansha) YAMASHITA Ichiro  Matsushita Advanced Technology Research Laboratories, Senior Engineer, 先端技術研究所, 主幹技師
FUYUKI Takashi  Nara Institute of Science and Technology, Graduate School of Materials Science, Professor, 物質創成科学研究科, 教授 (10165459)
HATAYAMA Tomoaki  Nara Institute of Science and Technology, Graduate School of Materials Science, Assistant Professor, 物質創成科学研究科, 助手 (90304162)
Project Period (FY) 2003 – 2004
KeywordsBio-nano process / ferritin protein / bottom-up / self assemble / bio-mineralization / plasma treatment
Research Abstract

Development of biotechnology has been remarkable, which enables us to fabricate nanoscale structures using biomolecules as nanoblocks. A combination of biotechnology and semiconductor technology is emerging as a promising candidate for enabling a breakthrough in the fabrication of advanced electronic devices. The main features of biotechnology from a nanotechnology point of view are as follows : Size distribution is extremely small on the molecular scale. Biomolecules can form nanostructures in a self-assembling manner, which is an essential part of the bottom-up fabrication technology. Protein has the ability to biomineralize inorganic materials at its surface. Utilizing these characteristics, we propose a novel bottom-up method for fabricating nanostructure with a very small size distribution.
We have a floating nano-dot gate metal-oxide-semiconductor field effect transistor(MOSFET). The floating nano-dots gate MOSFET is expected to be promising candidate component for next-generation memory such as flash memory. It is required that the floating nanod-dots have a small size distribution and should take the form of a high-density monolayer. We adopted the cage-shaped protein ferritin to satisfy these requirements. Ferritin has a protein shell, its outer and inner diameters are 12 nm and 7 nm, respectively, and it has fairly high thermal and pH stabilities compared with other proteins. The inner cavity can accommodate an iron oxide core (5Fe_2O_3・9H_2O). Therefore, iron oxide nano-dots with small size distribution can be artificially synthesized with ferritin molecules. It has also demonstrated that ferritin molecules can form a large two-dimensional crystal that is a high-density monolayer. Combining these characteristics, we fabricated a monolayer of ferritin with iron oxide cores.

  • Research Products

    (10 results)

All 2005 2004 2003

All Journal Article (10 results)

  • [Journal Article] Electron Injection into Si nanodot by side-wall type plasma enhanced chemical vapor deposition2005

    • Author(s)
      K.Ichikawa, P.Punchaipetch, H.Yano, T.Hatayama, Y.Uraoka, T.Fuyuki
    • Journal Title

      2005 International Meeting for Future of Electron Device, Kansai P-D7

      Pages: 97

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] 高分子電解質修飾基板を用いたフェリチンタンパクの高密度選択的吸着2005

    • Author(s)
      三浦篤志, 浦岡行治, 冬木隆, 山下一郎
    • Journal Title

      第52回応用物理学会関係連合講演会 29a-YL-6

      Pages: 1513

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Electron Injection into Si nano dot fabricated by Side-wall type plasma enhanced chemical vapor deposition2005

    • Author(s)
      Kazunori Ichikawa, Masato Mukai, P.Punchaipetch, Hiroshi Yano, Tomoaki Hatayama, Yukiharu Uraoka, Takashi Fuyuki, Eiji Takahashi, Tsukasa Hayashi, Kiyoshi Ogata
    • Journal Title

      IEEE/International Meeting for Future Electron Devices, Kansai P-D7

      Pages: 97

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] プラズマ援用化学気相堆積法を用いて堆積したSiナノドットへの電子注入2004

    • Author(s)
      市川和典, 猪飼順子, 彦野太樹夫, 矢野裕司, 畑山智亮, 冬木隆, 林司
    • Journal Title

      第51回応用物理学会関係連合講演会 28p-ZH-2

      Pages: 959

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Side-Wall電極型PECVDによるSiナノドットメモリ2004

    • Author(s)
      市川和典, 向正人, P.Punchaipetch, 矢野裕司, 畑山智亮, 浦岡行治, 冬木隆
    • Journal Title

      電子情報通信学会 信学技報 SDM2004-206

      Pages: 81

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Si nano-crystal dot memory fabricated by Side-wall Typed PECVD2004

    • Author(s)
      Kazunori Ichikawa, Masato Mukai, P.Punchaipetch, Hiroshi Yano, Tomoaki Hatayama, Yukiharu Uraoka, Takashi Fuyuki, Eiji Takahashi, Tsukasa Hayashi, Kiyoshi Ogata
    • Journal Title

      Technical Report of IEICE SDM2004-206

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] フェリチンタンパクのSi基板への直接吸着2003

    • Author(s)
      川嶋宏之, 彦野太樹夫, 山田圭佑, 浦岡行治, 山下一郎, 冬木隆
    • Journal Title

      電子情報通信学会 信学技報 SDM2003

      Pages: 93

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Si量子ドットを用いたフローティングゲートメモリ2003

    • Author(s)
      猪飼順子, 彦野太樹夫, 浦岡行治, 冬木隆, 桐村浩哉, 加藤健治
    • Journal Title

      電子情報通信学会 信学技報 SDM2003-192

      Pages: 87

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Direct adsorption of ferritin to Si substrate2003

    • Author(s)
      Hiroyuki Kawashima, Takio Hikono, Keisuke Yamada, Yukiharu Uraoka, Ichiro Yamashita, Takashi Fuyuki
    • Journal Title

      Technical Report of IEICE SDM2003-194

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] Floating Gate Memory with Si Quantum Dot2003

    • Author(s)
      Junko Ikai, Takio Hikono, Yukiharu Uraoka, Takashi Fuyuki, Hiroya Kirimura, Kenji Kato
    • Journal Title

      Technical Report of IEICE SDM2003-193

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2006-07-11  

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