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2005 Fiscal Year Final Research Report Summary

Generation of Giant Thermo-electric Power by Ultra-heavily Boron Doped SiGe and Its Application

Research Project

Project/Area Number 15360161
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionKanazawa University

Principal Investigator

SASAKI Kimihiro  Kanazawa University, School of Natural Science & Technology, Professor, 自然科学研究科, 教授 (40162359)

Project Period (FY) 2003 – 2005
KeywordsThermo-electric Effect / SiGe / Strain / Epitaxial Growth / Power Factor / Seebeck coefficient / Crystalline Defect / ZT
Research Abstract

Crystallinity :
Crystalline growth of SiGe films was slightly observed to take place at 400℃ from XRD measurement. Below that the films were amorphous structure. The films were confirmed epitaxially grown from RHEED observation. Above 500℃, crystallinity was improved.
Resistivity :
Until 400℃, film resistivity decreased with increasing growth temperature but above that, resistivity was increased again. This phenomena is explained that at low temperature carrier is not generated because of the amorphous structure. While crystalline growth proceeds, carrier comes to be generated. Under almost perfect crystalline structure, however, resistivity increases again because of intrinsic semiconductor resulting in no carrier genneration. The reason of low resistivity at 400℃ is considered that appropriate crystalline defects generated carriers, which could conduct within the crystallized region.
Seebeck coefficient :
SiGe films prepared showed large Seebeck coefficients of 1.5-2.0mV/K which is more than 3 times larger than that of bulk SiGe. No special coreration was observed on Seebeck coefficient with samples.
Thermo-electric performances :
Power factor was estimated from the Seebeck coeffcient and resistivity and showed as high as 7.2x10^<-2>Wm^<-1>K^<-2>. Moreover, the non-dimensional figure of merit Z reached ZT=1.3 at room temperature. This value shows useful for practical use.

  • Research Products

    (17 results)

All 2006 2005 2004 2003 Other

All Journal Article (15 results) Book (1 results) Patent(Industrial Property Rights) (1 results)

  • [Journal Article] Crystallinity and strain control growth of SiGe using ion sputtering technique2006

    • Author(s)
      Kimihiro Sasaki, Kazuya Yoshimori
    • Journal Title

      Thin Solid Films (In press)

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] A novel magnetron sputtering for flexible coatings as a function for production of high quality films2006

    • Author(s)
      C.Wang, K.Sasaki, Y.Yonezawa, T.Hata
    • Journal Title

      Vacuum (In press)

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Crystallinity and strain control growth of SiGe using ion sputtering technique2006

    • Author(s)
      Kimihiro Sasaki, Kazuya Yoshimori
    • Journal Title

      Thin Solid Films 508

      Pages: 124-127

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] Future Textile2006

    • Author(s)
      T.Hori, K.Sasaki et al.
    • Journal Title

      SENI-SHA

      Pages: 113-116

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] Unbalanced Magnetron Sputtering using Cylindrical Target for Low-temperature Optical Costing2005

    • Author(s)
      C.Wang, K.Sasaki, Y.Yonezawa, T.Hata
    • Journal Title

      Jpn.J.Appl.Phys. 44・1B

      Pages: 669-672

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] A novel magnetron sputtering for flexible coatings as a function for production of high quality films2005

    • Author(s)
      C.Wang, K.Sasaki, Y.Yonezawa, T.Hata
    • Journal Title

      Proc.of 8th Intern.Symposium on Sputtering & Plasma process

      Pages: 58-61

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] 劣化エピタキシャル成長したSi-Ge系薄膜の熱電特性2005

    • Author(s)
      渡瀬博之, 的場彰成, 佐々木公洋, 岡本庸一, 守本純
    • Journal Title

      第2回日本熱電学会学術講演会

      Pages: 66-67

    • Description
      「研究成果報告書概要(和文)」より
  • [Journal Article] Unbalanced Magnetron Sputtering using Cylindrical Target for Low-temperature Optical Costing2005

    • Author(s)
      C.Wang, K.Sasaki, Y.Yonezawa, T.Hata
    • Journal Title

      Jpn.J.Appl.Phys. 44[1B]

      Pages: 669-672

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] Thermo-electric Properties of Deteriorate Epitaxial Grown Si-Ge Based Thin Films2005

    • Author(s)
      H.Watase, A.Matoba, K.Sasaki, Y.Okamoto, J.Morimoto
    • Journal Title

      2nd Meeting of The Thermoelectrics Society of Japan

      Pages: 66-67

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] Sputter Growth SiGe Films-Epitaxy, Strain and Thermo-electric Properties2004

    • Author(s)
      K.Sasaki, T.Hata
    • Journal Title

      Abs.3^<rd> Intern.Workshop on New Group IV(Si-Ge-C) Semiconductors

      Pages: 45-46

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] Sputtering Epitaxy of SiGe Films Using Mixture Target2004

    • Author(s)
      K.Yoshimori, K.Sasaki, T.Hata
    • Journal Title

      Abs.2004 Intern.Sypmp.on Organic and Inorganic Materials and Related Nanotechnologies

      Pages: 202

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] Thermoelectric Properties of Si/Ge Multi-nanolaye Films Prepared by Ion-beam Sputtering Technique2004

    • Author(s)
      M.Kitai, H.Watase, K.Sasaki, T.Hata
    • Journal Title

      Abs.2004 Intern.Sypmp.on Organic and Inorganic Materials and Related Nanotechnologies

      Pages: 203

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] Epitaxial Growth of SiGe Films Grown by Ion-Beam Sputtering and Generation of Large Thermoelectric Power2004

    • Author(s)
      K.Sasaki, M.Kitai, H.Watase
    • Journal Title

      Tech.Dig.of 2004 AWAD

      Pages: 91-95

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] Anomalous large thermoelectric power on heavily B-doped SiGe thin films with thermal annealing2003

    • Author(s)
      T.Kawahara, S.M.Lee, Y.Okamoto, J.Morimoto, K.Sasaki, T.Hata
    • Journal Title

      Jpn.J.Appl.Phys. 41(8B)

      Pages: L949-L951

    • Description
      「研究成果報告書概要(欧文)」より
  • [Journal Article] A novel magnetron sputtering for flexible coatings as a function for production of high quality films

    • Author(s)
      C.Wang, K.Sasaki, Y.Yonezawa, T.Hata
    • Journal Title

      Vacuum (in press)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Book] Future Texile2006

    • Author(s)
      堀照夫監修, 佐々木公洋他
    • Total Pages
      438
    • Publisher
      繊維社
    • Description
      「研究成果報告書概要(和文)」より
  • [Patent(Industrial Property Rights)] 傾斜材料とこれを用いた機能素子2005

    • Inventor(s)
      畑 朋延, 佐々木 公洋, 森田 信一
    • Industrial Property Rights Holder
      IHI
    • Industrial Property Number
      10/538,776 PCT/JP2004/000055(特許2003-003192)
    • Filing Date
      2005-05-13
    • Description
      「研究成果報告書概要(和文)」より

URL: 

Published: 2007-12-13  

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