2004 Fiscal Year Final Research Report Summary
Production of multicharged iron ions and application to enhancement of photo-catalytic performance invisible light region on TiO_2 thin films
| Project/Area Number |
15540477
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Plasma science
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| Research Institution | Toyama Prefectural University |
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Principal Investigator |
KATO Yushi TOYAMA PREFECTURAL UNIV., FACULTY OF ENGINEERING, ASSOCIATE PROFESSOR, 工学部, 助教授 (40224547)
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| Project Period (FY) |
2003 – 2004
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| Keywords | ECR / Multicharged ion / Solid material source / Fe / TiO_2 / Photo-catalysis / Ion implantation / Enhancement of photo-catalytic performance in visible light region |
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| Research Abstract |
Multicharged iron ions have been produced from solid materials in a 2.45GHz electron cyclotron resonance (ECR) ion source (TAIKO device), and also large area TiO_2 thin films are individually produced by reactive sputtering in an arched ECR plasma.
Production of Fe ions has been made by direct sputtering, and by Ohmic heating, i.e., evaporating with Fe filament. The vaporized neutral Fe atoms are ionized in the ECR plasma. The multicharged ions are extracted from the opposite side of mirror end against the evaporator, and then multicharged ion beam is formed. The charge-state distributions (CSD) of the extracted ion current are investigated in various experimental conditions. Magnitude of ion beams has been tried to further enhance by improving the launch of the microwave and the extractor of ion beams. We have succeeded in producing multicharged ions up to Fe^<10+>. In the case of boron nitride (BN) crucible, nitrogen gas is released above 1500℃. And then multicharged nitrogen ions also produced and can be applied to material processing.
We normally form the TiO_2 thin film (〜100nm) on the Si(100) substrates. We measure the x-ray diffraction for characterization of the TiO_2 crystallinity and the contact angle of distilled water for estimation of photo-catalytic performance. The crystalline TiO_2 thin films are anatase and rutile phases. Fe^<3+> and N^<3+> ions were implanted into TiO_2 thin films on the Si substrates in order to enhance photo-catalytic performance in visible light region. The maximum efficiency of photo-catalytic performance has been obtained at the dose of about 2X10^<15> cm^<-2>. We compared contact angles of distilled water on the TiO_2 by illuminating fluorescent light for four hours before and after implantation. Photo-catalytic performance of the TiO_2 thin film in visible light region after implantation is better than that before implantation without deterioration in ultraviolet light region.
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[Journal Article] Electron cyclotron resonance multicharged ion source directly excited in a circular TE_<01>, mode cavity resonator2005
Author(s)
Kato, Yushi, Furuki, Hideyuki, Asaji, Toyohisa, Sasaki, Hiroshi, Ishii, Shigeyuki
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Journal Title
Ion Implantation Technology-2004 1(in press)
Description
「研究成果報告書概要(欧文)」より
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[Journal Article] Design of an ECR ion source directly excited in a selected microwavemodes cavity resonator for material processing2005
Author(s)
Asaji, T., Sasaki, H., Furuki, H., Kato, Y., Ishii, S., Kanazawa, M., Saito, J.
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Journal Title
Ion Implantation Technology-2004 1(in press)
Description
「研究成果報告書概要(欧文)」より
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