Precise measurement of optical constants of thin films in soft X-ray region

2017 Fiscal Year Final Research Report

• Project/Area Number: 15H03592
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Quantum beam science
• Research Institution: University of Hyogo
• Principal Investigator: Kinoshita Hiroo 兵庫県立大学, 産学連携・研究推進機構, 特任教授 (50285334)
• Co-Investigator(Kenkyū-buntansha): 原田 哲男 兵庫県立大学, 高度産業科学技術研究所, 助教 (30451636) ; 村松 康司 兵庫県立大学, 工学研究科, 教授 (50343918) ; 渡邊 健夫 兵庫県立大学, 高度産業科学技術研究所, 教授 (70285336)
• Co-Investigator(Renkei-kenkyūsha): WATANABE Takeo 兵庫県立大学, 高度産業科学技術研究所, 教授 (70285336) ; MURAMATSU Yasuji 兵庫県立大学, 工学研究科, 教授 (50343918)
• Project Period (FY): 2015-04-01 – 2018-03-31
• Keywords: 光学定数 / 透過率 / 吸収係数 / フォトレジスト / 極端紫外線 / フィルター / 多層膜

Outline of Final Research Achievements

In order to evaluate the optical constants, accurate reflectance evaluation is required. Significant things are higher order light removal, polarization control, scattering component removal. Among them, a high order light control mechanism and a polarization control mechanism were developed, and a beam line capable of accurate optical constant evaluation was constructed. In particular, the absorption coefficient of photoresist has become an important parameter of resist development, and the measured values by transmission method and reflection method are compared. In addition, the optical constants of Si, Mo, Zr, Si3N4, and TaN which are often used in the EUV region were measured. Furthermore, in the resonance absorption region of the carbon K absorption end of the photoresist, the optical constant was measured by the reflection method and compared with the spectrum measured by the total electron yield method.

Free Research Field

X線光学