Development of environmentally conscious cleaning method using cryogenic fine solid particles and its application to high density hydrogen storage

2017 Fiscal Year Final Research Report

• Project/Area Number: 15H03913
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Fluid engineering
• Research Institution: Tohoku University
• Principal Investigator: ISHIMOTO JUN 東北大学, 流体科学研究所, 教授 (10282005)
• Co-Investigator(Kenkyū-buntansha): 堀邊 英夫 大阪市立大学, 大学院工学研究科, 教授 (00372243) ; 松浦 一雄 愛媛大学, 大学院理工学研究科, 准教授 (20423577) ; 真田 俊之 静岡大学, 大学院総合科学技術研究科, 准教授 (50403978)
• Co-Investigator(Renkei-kenkyūsha): OCHIAI NAOYA 東北大学, 流体科学研究所, 助教 (40614508)
• Research Collaborator: Combescure Alain INSA de Lyon, LaMCoS, 教授
• Project Period (FY): 2015-04-01 – 2018-03-31
• Keywords: 混相流 / 極低温 / 微粒化 / 流体解析 / 噴霧 / 半導体洗浄 / 超高熱流束 / 冷却

Outline of Final Research Achievements

The application of cryogenic high-speed spray of micro-solid nitrogen (SN2) to the non-aqueous resist-removal and ultra-cleaning system of semiconductor wafer is a focus of great interest.
In the present study, we have newly developed the new single-component micro-nano SN2 particle production method by using super adiabatic Laval nozzle (converging-diverging nozzle). The physical photo resist removal-cleaning performance using cryogenic particulate spray are investigated by a new type of integrated ToF-SIMS, XPS measurement coupled supercomputing technique. As a result, it has been clarified that the newly developed cryogenic spray cleaning method is effective particularly for the removal and cleaning process of novolac type resists.

Free Research Field

流体工学