2016 Fiscal Year Final Research Report
Mist CVD method for inorganic-organic perovskites solar-cell
Project/Area Number |
15H06343
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Research Category |
Grant-in-Aid for Research Activity Start-up
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Allocation Type | Single-year Grants |
Research Field |
Crystal engineering
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Research Institution | Kyoto Institute of Technology |
Principal Investigator |
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Project Period (FY) |
2015-08-28 – 2017-03-31
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Keywords | 有機無機ペロブスカイト / ミストCVD / 混晶 |
Outline of Final Research Achievements |
Mist CVD method is a promising technique for the deposition technology of semiconductors to achieve the use of both solution precursors and vapor phase processes. We demonstrated the deposition of inorganic-organic perovskites in the capor phase via a chemical reaction using the solution precursors. The formation mechanism of the inorganic-organic perovskites grown by the laminar flow-type mist CVD method is a vapor phase reaction in spite of the fact that the solution were used as the CVD precursors. Furthermore, the mist CVD was applied to the growth process for alloying inorganic-organic perovskites taking advantages of using the solution precursors. We have successfully grown the alloying inorganic-organic perovskites (CH3NH3Pb(Br1-xClx)3)by mist CVD.
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Free Research Field |
結晶成長
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