Development of time-resolved ellipsometry technique using X-ray laser

2017 Fiscal Year Final Research Report

• Project/Area Number: 15K04685
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Thin film/Surface and interfacial physical properties
• Research Institution: National Institutes for Quantum and Radiological Science and Technology (2016-2017); Japan Atomic Energy Agency (2015)
• Principal Investigator: Imazono Takashi 国立研究開発法人量子科学技術研究開発機構, 関西光科学研究所 光量子科学研究部, 主幹研究員(定常) (50370359)
• Project Period (FY): 2015-04-01 – 2018-03-31
• Keywords: ビーム強度モニタ / 偏光解析 / 絶対反射率 / Ｘ線レーザー / 多層膜偏光素子 / フォトダイオード / 回折格子

Outline of Final Research Achievements

The purpose of this study is to develop a time-resolved ellipsometry technique using laser-driven plasma X-ray laser (XRL). It is necessary to measure accurately the beam intensity of the XRL beam with a large intensity fluctuation and then to analyze precisely the polarization state. In this study, the following has been developed: (1) two types of beam intensity monitors working at a wavelength of 13.9 nm based on a Mo/Si multilayer-coated photodiode and a molybdenum-overcoated diffraction grating; (2) soft X-ray ellipsometry with multilayer polarizing elements based on absolute reflectometry. The above is a basic technique for time-resolved ellipsometry that contributes to understand ultrashort pulse laser-materials interaction, such as laser-abration.

Free Research Field

工学