Liquid cluster ion beam processing of metal films for spintronics devices

2017 Fiscal Year Final Research Report

• Project/Area Number: 15K06015
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Electron device/Electronic equipment
• Research Institution: Kyoto University
• Principal Investigator: Ryuto Hiromichi 京都大学, 工学研究科, 講師 (20392178)
• Co-Investigator(Kenkyū-buntansha): 竹内 光明 京都大学, 工学研究科, 助教 (10552656)
• Project Period (FY): 2015-04-01 – 2018-03-31
• Keywords: クラスター / イオンビーム / スピントロニクス / マグネトロン / スパッタリング / 遷移金属 / アルコール

Outline of Final Research Achievements

Ethanol cluster ion beams were irradiated on metal surfaces to examine the possibility of applying the liquid cluster ion beam technique to the processing of metal films used in spintronics devices. To perform the processing of metal films using liquid cluster ion beams without exposing the fresh film surfaces just after deposition to the air, a setup combining a liquid cluster ion beam system and magnetron sputtering system was constructed. The sputtering yields of copper, tantalum, and platinum induced by ethanol cluster ions were much larger than those by argon monomer ions at 500 eV. The sputtering yields of metal films kept in vacuum were also larger than those exposed to the air after deposition. The possibility of the liquid cluster ion beam processing of metal films was demonstrated.

Free Research Field

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