Structural analysis of ABRZ formation at the resin-enamel interface

2017 Fiscal Year Final Research Report

• Project/Area Number: 15K11105
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Conservative dentistry
• Research Institution: Tokyo Medical and Dental University
• Principal Investigator: NIKAIDO Toru 東京医科歯科大学, 大学院医歯学総合研究科, 講師 (00251538)
• Co-Investigator(Kenkyū-buntansha): 井上 剛 東京医科歯科大学, 大学院医歯学総合研究科, 助教 (40431928) ; 高垣 智博 東京医科歯科大学, 大学院医歯学総合研究科, 助教 (60516300)
• Project Period (FY): 2015-04-01 – 2018-03-31
• Keywords: エナメル質 / ABRZ / 接着 / セルフエッチング接着システム / リン酸エッチング / 電子顕微鏡

Outline of Final Research Achievements

A self-etching primer is much milder than phosphoric acid, which is concerned in enamel bonding. The purpose of this study was to evaluate the acid-base resistant zone (ABRZ) at the adhesive/enamel interface of self-etching adhesives with/without prior phosphoric acid etching. After application of self-etching adhesives on enamel surfaces, a flowable composite was placed. For observation of the acid-base resistant zone (ABRZ), the bonded interface was subjected to the acid-base challenge, morphological attributes of the interface were observed using SEM. ABRZ formation was confirmed in all groups, however, the morphology of the ABRZ was adhesive material dependent. The funnel-shaped erosion beneath the interface was present in one-step self-etch adhesives. With phosphoric acid etching, the ABRZs were obviously thicker compared with no phosphoric acid etching. In the case of the one-step self-etching adhesives, enamel etching should be recommended to improve the interfacial quality.

Free Research Field

保存修復学