Composition patterning and functionalization on glass surface using electrical nanoimprint

2016 Fiscal Year Final Research Report

• Project/Area Number: 15K13297
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Nanomaterials engineering
• Research Institution: Hokkaido University
• Principal Investigator: Nishii Junji 北海道大学, 電子科学研究所, 教授 (60357697)
• Project Period (FY): 2015-04-01 – 2017-03-31
• Keywords: ナノインプリント / 微細周期構造 / コロナ放電 / ガラス / アルカリイオン

Outline of Final Research Achievements

One-dimensional structure of 700-nm period were imprinted on a sodaaluminosilicate
glass using a platinum-coated silica mold with application of DC voltage. The migration of network modifier cations below the anode side surface to the cathode side is a necessary condition for grating formation. Glass surfaces were chemically etched using a 55% KOH solution at 70 degC. The top area of the NAS grating ridge, where the non-contacted area of the mold is located, was etched preferentially. Finally, the reverse concavo-convex grating appeared by etching. Localized stress corrosion in the grating ridge is expected to be an origin of the anisotropic etching and the grating pattern formation. This study was published in OPTICAL MATERIALS EXPRESS (doi.org/10.1364/OME.7.001438).

Free Research Field

無機材料物性