Challenge to high-speed low-cost fabrication of large-area organic devices using the high-velocity molecular beam cell

2017 Fiscal Year Final Research Report

• Project/Area Number: 15K13954
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Electronic materials/Electric materials
• Research Institution: Nara Institute of Science and Technology
• Principal Investigator: Nakamura Masakazu 奈良先端科学技術大学院大学, 物質創成科学研究科, 教授 (80332568)
• Co-Investigator(Kenkyū-buntansha): 松原 亮介 静岡大学, 工学部, 助教 (60611530)
• Co-Investigator(Renkei-kenkyūsha): KOJIMA Hirotaka 奈良先端科学技術大学院大学, 物質創成科学研究科, 助教 (70713634)
• Project Period (FY): 2015-04-01 – 2018-03-31
• Keywords: 有機薄膜 / 真空蒸着法 / 高速分子線 / 有機薄膜デバイス / プロセスコスト削減

Outline of Final Research Achievements

To eliminate the disadvantages of vacuum-evaporation methods for the fabrication of organic semiconductor devices, long process time and high instrumental costs, the high-velocity molecular-beam (HVMB) cell with a hot capillary has been developed. By designing, manufacturing, and improving HVMB cells and general-use evaporation-source components, the growth rate became 50-fold faster than that by the conventional method. We have demonstrated that the total process time, including those for evacuation and cell heating/cooling, to fabricate a semiconductor layer of a transistor can be reduced to 1/3 of that by the conventional method. Sufficiently high carrier mobility is obtained by heating the substrate to 60°C even under the high-speed evaporation condition.

Free Research Field

有機エレクトロニクス