Development of nano-contamination detection using optical scattering of evanescent interference field

2016 Fiscal Year Final Research Report

• Project/Area Number: 15K13968
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Electron device/Electronic equipment
• Research Institution: Tokyo University of Agriculture and Technology
• Principal Investigator: UMEDA Norihiro 東京農工大学, 工学(系)研究科(研究院), 教授 (60111803)
• Project Period (FY): 2015-04-01 – 2017-03-31
• Keywords: ナノ粒子 / ナノコンタミネーション / エバネッセント干渉定在場 / 光散乱 / インライン検出 / 開口近接場プローブ / マイクロ流体ノズル / マイクロピペット

Outline of Final Research Achievements

Detection of nano-particle smaller than the diffraction limit is required in semiconductor manufacturing. To break through the limit, we proposed following two in-line particle detection techniques using near-field light. 1) Particle sizing technique using evanescent interference field (EIF) on a prism. When a nanoparticle passes through EIF, the scattering intensity of nanoparticle is periodically modulated. By calculating contrast of modulated scattering intensity, a particle size can be estimated easily. In this study, we measured EIF scattering from polystyrene particles in diameter 88 nm and 220nm on a prism. 2) Particle detection in the vicinity of micro ejection nozzle technique using apertured near-field probe. We fabricated a near-field probe from optical fiber and micro nozzle from glass pipette. We measured the fluorescence of fluorescent dye and fluorescent bead in the jet ejected from micro nozzle using near-field probe.

Free Research Field

ナノフォトニクス