Synthesis of beta-C3N4 by the dual-microwave plasma

2016 Fiscal Year Final Research Report

• Project/Area Number: 15K14186
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Material processing/Microstructural control engineering
• Research Institution: Kanto Gakuin University
• Principal Investigator: Takai Osamu 関東学院大学, 工学部, 教授 (40110712)
• Project Period (FY): 2015-04-01 – 2017-03-31
• Keywords: 硬質窒化炭素膜 / マイクロ波CVD装置 / 薄膜 / プラズマ

Outline of Final Research Achievements

β-C3N4 is theoretically predicted that the bulk modulus becomes a very large value of 427 GPa, which is comparable to the measured value of the bulk modulus of diamond of 442 GPa. However, it could not be realized by experiment. In this study, synthesis ofβ- C 3 N 4 has been tried by a dual microwave plasma chemical vapor deposition (CVD) method. We have developed the dual microwave plasma CVD system and developed a method to deposit carbon nitride film by independently controlling carbon and nitrogen radical sources.

Free Research Field

薄膜工学