Development of high speed deposition method of DLC films by ICP / PSD plasma CVD hybrid system

2017 Fiscal Year Final Research Report

• Project/Area Number: 15K21580
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Multi-year Fund
• Research Field: Power engineering/Power conversion/Electric machinery; Electronic materials/Electric materials
• Research Institution: Hachinohe National College of Technology (2016-2017); Ichinoseki National College of Technology (2015)
• Principal Investigator: kamada takaharu 八戸工業高等専門学校, 産業システム工学科電気情報工学コース, 助教 (50435400)
• Co-Investigator(Renkei-kenkyūsha): MUKAIGAWA Seiji 岩手大学, 理工学部, 教授 (60333754) ; WATANABE Masayuki 日本大学, 理工学部, 教授 (30271844) ; NAKAMURA Yoshitaka 八戸工業高等専門学校, 産業システム工学科, 准教授 (00290685)
• Project Period (FY): 2015-04-01 – 2018-03-31
• Keywords: 擬火花放電 / アモルファスカーボン膜 / ダイヤモンドライクカーボン膜 / ラマンスペクトル / XPS / プラズマ計測

Outline of Final Research Achievements

It was developed a deposition system for DLC films by using a pseudo-spark discharge plasma CVD method. The XPS spectrum indicated C1s peak that are typical of amorphous carbon.
The abundance ratio of sp3 bonding in the film and film hardness increased with rising of the substrate voltage. The maximum hardness was calculated to be 5.8 GPa at the substrate voltage of -300 V. By inserting the floating electrode between the electrodes, the ion density slightly decreased, and the plasma wasn’t ejected continuously. Hydrogen ICP was added to the system and its characteristics were investigated. At RF power of 300 W, the ion density at 200 mm downstream from coil was of the order of 1012 cm-3. Furthermore, it was confirmed that the phase difference between current and voltage changes with respect to RF power (50~300 W).

Free Research Field

プラズマ理工学、高電圧工学