2016 Fiscal Year Final Research Report
Sputtering deposition using powder as a target and elucidation of its process plasma reaction mechanism
| Project/Area Number |
15K21595
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Multi-year Fund |
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| Research Field |
Plasma electronics
Thin film/Surface and interfacial physical properties
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| Research Institution | Sasebo National College of Technology |
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Principal Investigator |
OHSHIMA Tamiko 佐世保工業高等専門学校, 電気電子工学科, 准教授 (00370049)
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| Research Collaborator |
KAWASAKI Hiroharu
SUDA Yoshiaki
AOKI Shinichi
IKEGAMI Tomoaki
KAJIMA Atsushi
NAKAMIYA Toshiyuki
MITSUGI Fumiaki
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| Project Period (FY) |
2015-04-01 – 2017-03-31
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| Keywords | スパッタリング / 粉体ターゲット / 低融点有機材料 / 多元素複合材料 |
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| Outline of Final Research Achievements |
In this research, we have studied preparation of (1) low melting point organic material thin film and (2) multi element composite material thin film which are difficult to prepare with solid target used in general sputtering method. We have obtained following results.
(1)Optimization of sputtering conditions necessary for stable film deposition of organic EL Alq 3 thin film was carried out.
(2)In Al-doped zinc oxide (AZO) thin films using mixed powders, the combination of materials to be mixed and the mixing ratio were optimized. Improvement of electrical characteristics could be achieved by further adding Al to the mixed powder and optimizing the addition amount.
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| Free Research Field |
プラズマエレクトロニクス
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