Development of High Precision Profiler

2005 Fiscal Year Final Research Report Summary

• Project/Area Number: 16360073
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Production engineering/Processing studies
• Research Institution: High Energy Accelerator Research Organization (KEK)
• Principal Investigator: HIGASHI Yasuo High Energy Accelerator Organization, Assistant professor, 機械工学センター, 助教授 (70208742)
• Co-Investigator(Kenkyū-buntansha): UENO Kenji High Energy Accelerator Organization, Assistant Professor, 機械工学センター, 教授 (40370069) ; KUME Tatsuya High Energy Accelerator Organization, Assistant Engineer, 機械工学センター, 助手 (40353362) ; ENAMI Kazuhiro High Energy Accelerator Organization, Assistant Engineer, 機械工学センター, 助手 (00370073) ; ENDO Katuyoshi Graduate of Osaka University, Assistant Professor, 大学院・工学研究科, 教授 (90152008) ; YAMAUCHI Kazuto Graduate of Osaka University, Professor, 大学院・工学研究科, 教授 (10174575)
• Project Period (FY): 2004 – 2005
• Keywords: Synchrotron radiation optics / EUV / surface figuring / slope error / normal vector / goniometers / asymmetric aspheric figure

Research Abstract

A new ultra-precision profiler has been developed in order to measure such as asymmetric and aspheric profiles. In the present study, the normal vectors at each points on the surface are determined by the reflected light beam goes back exactly on the same path as the incident beam. The surface gradients at each point are calculated from the normal vector and the surface profile is obtained by integrating the gradient. The measuring instrument was designed according to the above principle of the measuring method. In the design, four ultra-precision goniometers were applied to the adjustment of the light axis for the normal vector measurement. The angle positioning resolution and accuracy of each goniometer are respectively 0.018μrad and 0.2μrad. In the measuring instrument, the most important item is the measuring accuracy of the normal vectors by the goniometers. Therefore, the rotating angle positioning errors were measured and calibrated. A SiC flat mirror 25.4mm in diameter and an elliptical profile mirror for nanometer hard X-ray focusing were measured. and compared to the measured profile using a Zygo Mark IVxp phase-measuring interferometer. The absolute measurement accuracy of approximately 5 nm (peak-to-valley) was achieved. Then the measurement of a spherical shape and 460mm, 1m long plane mirrors were demonstrated.

Research Products

• [Journal Article] Surface Gradient Integrated Profiler for X-ray and EUV Optics -Calibration of the rotational angle error of the rotary encoders- (2006)
  • Author(s): Yasuo Higashi, Yuichi Takaie, Katsuyoshi Endo, Tatsuya Kume, Kazuhiro Enami, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano, Kenii Ueno, Yuzo mori
  • Journal Title: SR12006, Proc. of the Ninth International Conference on Synchrotron Radiation Instrumentation, May28-June2, 2006, DAEGU, EXCO, KOREA (In printing)
  • Description: 「研究成果報告書概要(和文)」より
• [Journal Article] Surface Gradient Integrated Profiler for X-ray and EUV Optics (2006)
  • Author(s): Yasuo Higashi, Yuichi Takaie, Katsuyoshi Endo, Tatsuya Kume, Kazuhiro Enami, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano, Kenii Ueno, Yuzo mori
  • Journal Title: SR12006, Proc. of the Ninth International Conference on Synchrotron Radiation Instrumentation, May28-June2, 2006, DAEGU, EXCO, KOREA (In printing)
  • Description: 「研究成果報告書概要(和文)」より
• [Journal Article] シンクロトロン放射光用ミラーのための超精密非球面形状測定装置の開発 (2006)
  • Author(s): 森勇蔵, 遠藤勝義, 宮脇崇, 瀬戸口大輔, 鷹家優一, 東保男, 久米達哉, 江並和宏
  • Journal Title: 2006年精密工学会春季大会学術講演会講演論文集
  • Description: 「研究成果報告書概要(和文)」より
• [Journal Article] Surface Gradient Integrated Profiler for X-ray and EUV Optics-Calibration of the rotational angle error of the rotary encoders- (2006)
  • Author(s): Y.Higashi, Y.Takaie, K.Endo, T.Kume, K.Enami, K.Yamauchi, K.Yamamura, K.Ueno, Y.Mori
  • Journal Title: SR12006, Proc.of the Ninth International Conference on Synchrotron Radiation Instrumentation (May28-June2, 2006, DAEGU, EXCO, KOREA)
  • Description: 「研究成果報告書概要(欧文)」より
• [Journal Article] Surface Gradient Integrated Profiler for X-ray and EUV Optics (2006)
  • Author(s): Y.Higashi, Y.Takaie, K.Endo, T.Kume, K.Enami, K.Yamauchi, K.Yamamura, K.Ueno, Y.Mori
  • Journal Title: SR12006, Proc.of the Ninth International Conference on Synchrotron Radiation Instrumentation (May28-June2, 2006, DAEGU, EXCO, KOREA)
  • Description: 「研究成果報告書概要(欧文)」より
• [Journal Article] A new Designed High-Precision Profiler (2005)
  • Author(s): Y.Higashi, Y.Takaie, K.Endo, T.Kume, K.Enami, K.Yamauchi, K.Yamamura, K.Ueno, Y.Mori
  • Journal Title: SPIE Annual Meeting (Opto photonics) Proceedings, San Diego, USA, in printing (2005) (In printing)
  • Description: 「研究成果報告書概要(和文)」より
• [Journal Article] A new Designed High-Precision Profiler - Study on Mandrel measurement- (2005)
  • Author(s): Y.Higashi, Y.Takaie, K.Endo, T.Kume, K.Enami, K.Yamauchi, K.Yamamura, K.Ueno, Y.Mori
  • Journal Title: XRM2005 International Meeting Proceedings Hirneji, Japan, in printing (2005) (In printing)
  • Description: 「研究成果報告書概要(和文)」より
• [Journal Article] A new Designed High-Precision Profiler (2005)
  • Author(s): Y.Higashi, Y.Takaie, K.Endo, T.Kume, K.Enami, K.Yamauchi, K.Yamamura, K.Ueno, Y.Mori
  • Journal Title: SPIE Annual Meeting (Opto photonics) Proceedings, San Diego, USA (in printing)
  • Description: 「研究成果報告書概要(欧文)」より
• [Journal Article] A new Designed High-Precision Profiler-Study on Mandrel measurement- (2005)
  • Author(s): Y.Higashi, Y.Takaie, K.Endo, T.Kume, K.Enami, K.Yamauchi, K.Yamamura, K.Ueno, Y.Mori
  • Journal Title: XRM2005 International Meeting Proceedings Himeji, Japan (in printing)
  • Description: 「研究成果報告書概要(欧文)」より