2006 Fiscal Year Final Research Report Summary
Study on Functional Surface Formation by Liquid Cluster Ion Beams
| Project/Area Number |
16360152
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Electronic materials/Electric materials
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| Research Institution | Kyoto University |
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Principal Investigator |
TAKAOKA Gikan Kyoto Univ., Grad.School of Engineering, Professor, 工学研究科, 教授 (90135525)
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| Co-Investigator(Kenkyū-buntansha) |
ISHIKAWA Junzo Kyoto Univ., Grad.School of Engineering, Professor, 工学研究科, 教授 (80026278)
KAWASHITA Masakazu Kyoto Univ., Grad.School of Engineering, Lecturer, 工学研究科, 講師 (70314234)
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| Project Period (FY) |
2004 – 2006
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| Keywords | Liquid cluster / Ion beam / Size analysis / Functional surface / Surface cleaning / Smooth surface / Surface reaction dynamics / Nano technology |
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| Research Abstract |
A cluster is an aggregate of a few tens to several thousands of atoms, and constitutes a new phase of matter, with significantly different properties than solids, liquids and gases. They are tiny particles, which are in a position to a link between atomic state and bulk state. Cluster beams are useful tools for the investigation of the fundamentals of solid state physics, chemistry and related materials science. In this study, we have developed a liquid cluster ion beam system, and have produced liquid clusters such as alcohol, water and paraffin clusters by adiabatic expansion phenomenon. Furthermore, we have applied the liquid cluster ion beam technique to various industrial fields such as electric and electronic engineering, optical and mechanical engineering, and chemical engineering.
In order to clarify the interactions of the liquid cluster ions with solid surfaces such as Si(100), Si0_2 and/or metal surfaces, sputtering and cleaning effects were investigated using the time-of-flight and the retarding potential methods. The physical and chemical sputtering, which was much enhanced by the liquid cluster ion irradiation, was different depending on the species of the cluster and the substrate materials. For example, for the chemical sputtering of the Si surfaces by the ethanol cluster ion beams, the energy per molecule in a cluster was of much importance, and the optimum energy range was between 1 eV/molecule and 10 eV/molecule. For the case of Au surfaces, the sputtered depth decreased with the increase of the retarding voltage, and the physical sputtering was influenced by the minimum size of the cluster. Thus, the surface reaction dynamics between the liquid clusters and the surface atoms were significantly different from that of conventional wet processes.
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