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2016 Fiscal Year Annual Research Report

Development of multi-focused ion beams for highly functional nano-dimension free processing

Research Project

Project/Area Number 16H02093
Research InstitutionTohoku University

Principal Investigator

桑野 博喜  東北大学, 未来科学技術共同研究センター, 教授 (50361118)

Co-Investigator(Kenkyū-buntansha) 大口 裕之  東北大学, 材料科学高等研究所, 准教授 (40570908)
LE VANMINH  東北大学, 工学研究科, 助教 (60765098)
Project Period (FY) 2016-04-01 – 2021-03-31
KeywordsFocused ion beams / multi-ion sources / ion source / ionic liquid
Outline of Annual Research Achievements

We developed the multi-focused ion beams (multi-FIB) with 5x5 Si-emitter arrays by Si micromachining. Two types of the multi-FIBs with the front-side and the back-side (ionic liquid) IL supplies obtained the emitter tip of sub-50 nm, the diameter of 180 μm and the height of 240 μm for convenient IL supplies. Three types of IL sources including EMIM-Im, EMIM-BF4, and BMIM-PF6 were investigated in this study. The high etching rates of the irradiated Si target were obtained by F-based ion sources. The EMIM-Im showed the highest maximum etching rate of approximately 1600 μm3/min. The interaction of the ion beams and Si targets by in-situ mass spectra and the chemical shifts of Si2p binding energy by the X-ray photoelectron spectra confirmed the reactive mechanism of the ion beam sources.

Current Status of Research Progress
Current Status of Research Progress

2: Research has progressed on the whole more than it was originally planned.

Reason

イオン液体を用いたマルチ集束イオンビームの特性について加工に影響するイオン種、エネルギー、イオンビーム照射面の表面分析などにより明らかにした。これはほぼ計画通りの成果である。

Strategy for Future Research Activity

Ion beam emission analysis:
The multi-FIB is supplied with three IL sources such as EMIM-Im, EMIM-BF4, and BMIM-PF6 ion liquid for characterizing the ion beam emission. The I-V curves will be investigated in the range of applied voltage from 0 V to 5 kV.
The ion emission currents of three types IL sources will be measured. Three IL sources will be clarified by exhibiting clearly the starting emission voltage. Since the emission current is increased distinctively from BMIM-BF6, EMIM-Im, to EMIM-BF4 at the same applied voltage, some influence of ion beam acceleration voltage should be clarified a analysis of beam species. The aim of the research is to clarify a mechanism of this IL ion emission and to increase the ion beam current.

  • Research Products

    (1 results)

All 2016

All Journal Article (1 results) (of which Peer Reviewed: 1 results)

  • [Journal Article] Micromachined multiple focused-ion-beam devices2016

    • Author(s)
      Ryo Yoshida, Motoaki Hara, Hiroyuki Oguchi, Hiroki Kuwano
    • Journal Title

      Journal of Vacuum Science & Technology

      Volume: B 34 Pages: 022001

    • DOI

      10.1116/1.4943561

    • Peer Reviewed

URL: 

Published: 2021-12-27  

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