非水電析の高度化に向けた反応場制御～3つの速度論的アプローチ～

Products Report

• Project/Area Number: 16H02411
• Research Category: Grant-in-Aid for Scientific Research (A)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Metal making/Resorce production engineering
• Research Institution: Kyoto University
• Principal Investigator: Murase Kuniaki 京都大学, 工学研究科, 教授 (30283633)
• Co-Investigator(Kenkyū-buntansha): 深見 一弘 京都大学, 工学研究科, 准教授 (60452322) ; 北田 敦 京都大学, 工学研究科, 助教 (30636254)
• Research Collaborator: INOGUCHI Shota ; KATO Yukiya ; KAWATA Kio ; KINTSU Kohei ; KOYAMA Akira ; SAKURAI Akihiro ; TAKEOKA Shun ; MIZUNO Yuta ; YASOSHIMA Juni
• Project Period (FY): 2016-04-01 – 2019-03-31

Research Products

• [Journal Article] Spontaneous Symmetry Breaking of Nanoscale Spatiotemporal Pattern as the Origin of Helical Nanopore Etching in Silicon (2019)
  • Author(s): T. Yasuda, Y. Maeda, K. Matsuzaki, Y. Okazaki, R. Oda, A. Kitada, K. Murase, and K. Fukami
  • Journal Title: ACS Applied Materials & Interfaces Volume: 11 Issue: 51 Pages: 48604-48611
  • DOI: 10.1021/acsami.9b18025
  • Peer Reviewed / Int'l Joint Research
• [Patent(Industrial Property Rights)] 金属または金属塩の溶解用溶液およびその利用 (2022)
  • Inventor(s): 北田 敦、安達 謙、邑瀬邦明
  • Industrial Property Rights Holder: 京都大学
  • Industrial Property Rights Type: 特許
  • Industrial Property Number: 特許第7095867号